In chemical vapor deposition (CVD)
growth of graphene, intrinsic
carbon in copper has been shown to play a role, especially during
the nucleation phase. Here, we report experimental results on depletion
of carbon from the bulk of a Cu foil to its surface at different hydrogen
pressures, which explain new aspects of the interplay between hydrogen
and intrinsic carbon prior to growth. We observed that rising H
2
pressure boosts carbon depletion to the surface, but at the
same time, at elevated H
2
pressures, the graphitic film
formed on the Cu surface is etched away at a faster rate. This effect
led us to practice annealing of copper under high hydrogen pressure
as an approach to decrease the total content of carbon in the copper
foil and consequently reducing the nucleation density of graphene
flakes. These results enhance our understanding about the role of
H
2
in the CVD process and explain some of the inconsistencies
among the earlier reports.