Sputter deposition

Rohde, S. L.; Münz, W.‐D.

doi:10.1007/978-94-011-3040-0_5

Cited by 6 publications

(3 citation statements)

References 84 publications

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“…At low N 2 flow rate, all the reactive gas is gettered by the Ti and Al atoms ejected from the target. Consequently, the partial pressure practically does not change, and the sputtering yield is high 21 . At about (8.7 ± 0.1) sccm, the partial pressure of N 2 changes abruptly due to a slight change in the reactive gas flow.…”

Section: Hysteresis Processmentioning

confidence: 99%

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

2023

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Thin films of titanium aluminum nitride (Ti (1-x) Al x N) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (7.2 ± 0.1) sccm and (6.8 ± 0.2) sccm, respectively. The relations between the process parameters and the crystallographic orientation were investigated. Chemical and mechanical properties were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and instrumented indentation technique (IIT). X-ray diffraction spectra and electron diffraction patterns revealed the presence of a Ti (1-x) Al x N phase with a face-centered cubic structure in both films. In metal mode, the coatings exhibited a preferential (111) plane orientation, changing to (200) in the compound mode. The change in preferential orientation was influenced by the reactive gas partial pressure.

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Section: Hysteresis Processmentioning

confidence: 99%

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

2023

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“…It was reported that the sputtering yield of carbon accounts for only $20% of the sputtering yields of Ti and V under Ar-ion bombardment. 47 Consequently, the different sputtering yields resulted in preferential sputtering removal of elements other than carbon during the ion beam milling, which thereafter left an almost pure carbon top layer on the surface of the foil.…”

Section: Tem-eels Analysismentioning

confidence: 99%

Structure characterization and tribological study of magnetron sputtered nanocomposite nc-TiAlV(N,C)/a-C coatings

et al. 2011

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Grown by reactive unbalanced magnetron sputtering in a mixed N2 and CH4 gaseous medium, heterogeneous nanocomposite coatings in the Ti-Al-V-N-C system show extraordinarily excellent tribological performance of coated machining tools. Using analytical high resolution TEM, EELS, FEG-SEM, XRD, and Raman spectroscopy, this paper reports detailed structural and chemical characterization of the coatings grown at various CH4: N2 ratios. Meanwhile, the mechanical and tribological properties were also measured, including hardness, Young's modulus, residual stress and the dry-sliding friction and wear at varying environmental humidity. When CH4 gas was introduced in the deposition, the structure of the coatings has been found to experience a change from nano-scale TiAlN-VN multilayer architecture to a complex mixture of columnar grains of nc-TiAlV(N,C)/a-C nanocomposites and inter-column network of sp 2 -type amorphous carbon. Carbon incorporation and segregation also shows remarkable influence on the columnar growth model by leading to finer grain size. As compared to the carbon-free nitride coating, the nanocomposite coatings showed substantially reduced residual stress owing to the freecarbon precipitation, whereas the coatings maintained comparable hardness to the carbon-free TiAlN/VN. Their tribological properties were found to be strongly dependent on the environment. In humid air at RH > 30%, the coatings showed low friction coefficient less than 0.4 and extremely low wear rate at a scale of ~10 -17 m 3 N -1 m -1 .

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“…The earliest form of PVD is sputtering, which was first conceptualized by E.R. Grove in 1842 with his discovery that the surface of a solid could be eroded by an impinging flux of accelerated positive ions Rohde and Munz (1991). These processes have been used to deposit films of metals, alloys, metal oxides, and some composite materials on various substrates.…”

Section: Physical Vapor Deposition Techniquesmentioning

confidence: 99%

Development of a novel pulsed laser deposition system for rare earth thin films

Rohde

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Sputter deposition

Cited by 6 publications

References 84 publications

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

Structure characterization and tribological study of magnetron sputtered nanocomposite nc-TiAlV(N,C)/a-C coatings

Development of a novel pulsed laser deposition system for rare earth thin films

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