Sputtering and chemical modification of solid surfaces using oxygen ion beams

Takaoka, Gikan H.; Ryuto, Hiromichi; Takeuchi, Mitsuaki; Tsujinaka, Ryou

doi:10.1109/iit.2014.6939980

Cited by 1 publication

(1 citation statement)

References 18 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Cluster ion beams have several advantages for material surface modification [10][11][12][13]. For example, high-density irradiation enhances the surface temperature of the impact region, which enhances the chemical reactions occurring on the surface.…”

Section: Introductionmentioning

confidence: 99%

Mesenchymal Stem Cell Adhesion on Metal and Polymeric Surfaces Modified by Oxygen Cluster Ion Irradiation

Takaoka

Tsujinaka

Takeuchi

et al. 2014

Trans. Mat. Res. Soc. Japan

Self Cite

View full text Add to dashboard Cite

Polyethylene (PE) and Ti surfaces were irradiated with oxygen cluster ions. For PE surfaces, the sputtered depth increased with an increase in acceleration voltage, and the sputtering yield was approximately 243 molecules per ion at an acceleration voltage of 9 kV. Atomic force microscopy showed that surface roughness increased with an increase in acceleration voltage. The contact angle was between 70° and 80°, which was smaller than that for the unirradiated surface. Adhesion of mesenchymal stem cells (MSCs) could be obtained by adjusting acceleration voltage, although cell adhesion was not observed on the unirradiated surfaces. For Ti surfaces, the surface roughness did not change with cluster ion irradiation. However, the contact angle decreased with an increase in acceleration voltage, and it was 46° at an acceleration voltage of 9 kV. Furthermore, after ultraviolet light irradiation for 30 min, the contact angle decreased to 28°. With regard to cell adhesion, the number of MSCs attached to the Ti surface increased after oxygen cluster ion irradiation.

show abstract

Section: Introductionmentioning

confidence: 99%