Sputtering by ion bombardment theoretical concepts

Sigmund, Peter

doi:10.1007/3540105212_7

Cited by 467 publications

(183 citation statements)

References 115 publications

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“…6͒. Based on calculations of Sigmund, 33 Windischmann, 13 Seitz and Koehler, 20 and Davis 11 found that the stress, , varies as a function of the ion energy as follows:…”

Section: Resultsmentioning

confidence: 99%

Stress-induced formation of high-density amorphous carbon thin films

Schwan

Ulrich

Theel

et al. 1997

Journal of Applied Physics

115

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Amorphous carbon films with high sp 3 content were deposited by magnetron sputtering and intense argon ion plating. Above a compressive stress of 13 GPa a strong increase of the density of the carbon films is observed. We explain the increase of density by a stress-induced phase transition of sp 2 configured carbon to sp 3 configured carbon. Preferential sputtering of the sp 2 component in the carbon films plays a minor role compared to the sp 2 ⇒sp 3 transition at high compressive stress formed during the deposition process. Transmission electron microscopy shows evidence of graphitic regions in the magnetron sputtered/Ar plated amorphous carbon thin films. Differences in the microstructure of the tetrahedral amorphous carbon ͑ta-C͒ films deposited by filtered arc and mass selected ion beam; and those films deposited using magnetron sputtering combined with intense ion plating can be used to explain the different electronic and optical properties of both kinds of ta-C films. © 1997 American Institute of Physics. ͓S0021-8979͑97͒09422-X͔ INTRODUCTIONCarbon films have been of considerable research interest since Aisenberg and Chabot 1 deposited the first hard, diamondlike amorphous carbon films. Amorphous carbon films with a high fraction of sp 3 hybridized carbons have been deposited by filtered cathodic vacuum arc ͑FCVA͒ 2-4 and mass selected ion beams. 5-8 C ϩ ions are used to deposit the amorphous carbon films by both techniques. Different mechanisms for the formation of the sp 3 rich phase have been proposed such as the shallow implantation process ͑subplantation͒ by Lifshitz et al.,5,6 selective sputtering processes by Reinke and Kuhr 9 ͑discussed for c-BN͒, and stressinduced phase transition processes by McKenzie et al. 3,10 Analytical expressions for the subplantation process describing the formation of stress and the densification have been proposed by Davis 11 and Robertson. 12 The basic idea of the models by Davis and Robertson is that a carbon ion needs at least the displacement energy to penetrate into the carbon film leading to a densification of subsurface layers of the evolving film. 6 But, not all the energy of the energetic carbon ion is used for penetration ͑displacement processes͒. Part of the ion energy is used by momentum transfer collisions which results in a thermal spike. Davis 11 and Robertson 12 modified calculations of Windischmann 13 by allowing implanted carbon atoms to relax to the film surface, due to the high localized temperature generated by the impinging C ϩ ions in the thermal spike. Yet, questions as to the validity of a thermal spike at ion energies of a few hundred electron volts in a low elemental mass material remains unanswered. Nevertheless, at such impact energies several thousand vibrations are involved for a time period of the order of 10 Ϫ12 s. 14 Dense and highly tetrahedral amorphous carbon films have also been deposited by the laser ablation technique, 15,16 by dual ion beam technique, 17 and recently by magnetron sputtering together with intense ion plating ͑MS/I...

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“…6͒. Based on calculations of Sigmund, 33 Windischmann, 13 Seitz and Koehler, 20 and Davis 11 found that the stress, , varies as a function of the ion energy as follows:…”

Section: Resultsmentioning

confidence: 99%

Stress-induced formation of high-density amorphous carbon thin films

Schwan

Ulrich

Theel

et al. 1997

Journal of Applied Physics

115

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“…In the present study, we demonstrate theoretical mass spectra of the (PE, PP, PS, PET) polymers as an ultimate work calculated by the QMD using the model oligomers under the main assumption of the thermal decomposition process corresponding to the thermal sputtering one (as a process of sputtering) proposed by Sigmund [27]. In the QMD calculation, we are able to visualize decomposition, reiterative recombination with a hydrogen atom, and cross-linking of fragments through the animation of the thermal decomposition process.…”

Section: Introductionmentioning

confidence: 80%

Theoretical Mass Spectra of PE, PP, PS and PET Polymers by QMD Methods Using the Model Molecules

Endo

Hayashi

Ida

et al. 2010

JSA

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We used a quantum molecular dynamics {QMD (MD with MO)} due to the force function of MO with the velocity Verlet algorithm using the model oligomers of PE, PP, PS, and PET polymers to obtain theoretical mass spectra of the polymers. The QMD calculation was performed in the thermal energy range of 0.69 ∼ 0.95 eV, and the sampling position data by a time step of 0.5 fs were performed up to 5000 steps. The fragments at the final step of 60 trajectories in the QMD were obtained as positive, negative, and neutral charged ones from the net atomic charge analysis at geometry-optimization of the MO SCF calculations. We can compare the positive ion fragments of polymer models with the experimental distribution of polymers in mass spectra and secondary ionization mass spectra after a few tens of keV of primary heavy metal ion bombardment. We also showed the chemical structures of fragments for PE, PP, PS, and PET polymers in positive ion spectra, unavailable from experimental methods.

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“…Most of the sputtering yield is due to ejections from solids upon interaction of these collision cascades with the surface. Sputtering yield theories [8,10] predict that the yield S or the total flux of atoms sputtered in all directions and energies for unit flux of incident ions is directly proportional to the deposited energy d F and inversely to the surface binding energy b E of the target atoms as ∝ ⁄ . The density of energy deposition at the surface can be further estimated [8] by using the nuclear stopping cross section ( ); ≈ ( ) ( ) where = ( ⁄ ) is a target to projectile mass dependent parameter and is the target density.…”

Section: B Emission From Direct Recoil Compared With Collision Cascamentioning

confidence: 99%

Energy spectra of charged clusters recoiling from Xe⁺irradiated graphite surface

Ahmad

2000

Radiation Effects and Defects in Solids

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Sputtering by ion bombardment theoretical concepts

Cited by 467 publications

References 115 publications

Stress-induced formation of high-density amorphous carbon thin films

Stress-induced formation of high-density amorphous carbon thin films

Theoretical Mass Spectra of PE, PP, PS and PET Polymers by QMD Methods Using the Model Molecules

Energy spectra of charged clusters recoiling from Xe⁺irradiated graphite surface

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Sputtering by ion bombardment theoretical concepts

Cited by 467 publications

References 115 publications

Stress-induced formation of high-density amorphous carbon thin films

Stress-induced formation of high-density amorphous carbon thin films

Theoretical Mass Spectra of PE, PP, PS and PET Polymers by QMD Methods Using the Model Molecules

Energy spectra of charged clusters recoiling from Xe+irradiated graphite surface

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Energy spectra of charged clusters recoiling from Xe⁺irradiated graphite surface