Sputtering deposition and characterization of Ru-doped WO3 thin films for electrochromic applications

Abstract

Abstract. Mixed tungsten-ruthenium oxide thin films were prepared for the first time by de magnetron co-sputtering technique and were studied by cyclic voltammetry, optical transmission measurements, Raman spectroscopy and the W L 3 and Ru K edges X-ray absorption spectroscopy (XAS) in comparison with pure WO3 films. The Ru concentration was varied in the range from 0 to 28 at.%. XAS results suggest that the average local structure around both tungsten and ruthenium ions remains unchanged within experimental accuracy in all samples, moreover, for tungsten ions, it resembles that of pure WO3 films. However, the presence of the ruthenium ions affects the electrochemical and optical properties of the films. Our results suggest that mixed films are formed by tungsten trioxide grains surrounded by ruthenium oxide phase.

Ruthenium Nanoparticles Decorated Tungsten Oxide as a Bifunctional Catalyst for Electrocatalytic and Catalytic Applications

“…In this context, the enhanced catalytic activity may be due to the dispersed Ru NPs on the surfaces of the WO 3 support, which tend to promote formations of active W 5+ sites during the reaction. Such synergistic effect between the Ru NPs and the WO 3 support was accountable for the superior performances during catalytic reactions. , …”

Polymer assisted deposition of electrochromic tungsten oxide thin films

“…The Raman spectrum of the WO 3 films shows an appreciable variability in shape, depending on the crystallinity degree, the amount of water, the porosity of the film. For such reasons different spectra are obtained using different deposition techniques, or even changing the parameters within a chosen method [24]. In films deposited by PAD, the high intensity peaks are obtained at 997 cm −1 , 789 cm −1 and 564 cm −1 for as deposited films (Fig.…”

Synthesis of WO3 Nanogranular Thin Films by Hot‐Wire CVD

“…, which is ascribed to W 6þ ÀO bonds [49] in amorphous WO 3 , [50] and a broad band also characteristic of amorphous tungsten oxide at $950 cm À1 , which is attributed to the W 6þ ¼O stretching mode of terminal oxygen atoms [51] in weak interaction with water molecules. [17,52] For the deposition of 15 min, the amorphous band at $950 cm À1 is still observed, however for longer deposition times the broad band is absent, which indicates that such films do not contain water; furthermore the spectrum indicates the growth of crystallites and, hence, a reduction of the amount of amorphous material.…”