Sputtering of material from the surface of PuO2 crystals by collision cascades impact. A molecular dynamics study

Nekrasov, K. A.; Seitov, D. D.; Pomosova, A. A.; Kupryazhkin, A. Ya.; Gupta, Sanjeev K.; Usseinov, А.

doi:10.1016/j.nimb.2020.04.034

Cited by 4 publications

(1 citation statement)

References 46 publications

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“…The spectra depicted in Figure 10(a) support the theoretical suggestion that the layers produced by SA are single atomic layers, since no 232 U is visible in the spectrum of the catcher foil. In thicker deposits with several atomic layers, clusters of the source material are expected to be sputtered due to alpha decay collision cascades in deeper layers [38]. Furthermore, the areal distribution of 232 U in the RI is as homogeneous as the distribution of 233 U in the RI of Figure 7(b).…”

Section: Self-adsorptionmentioning

confidence: 97%

Alpha spectrometric characterization of thin ²³³U sources for ^229(m)Th production

et al. 2020

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Four different techniques were applied for the production of 233U alpha recoil ion sources, providing 229Th ions. They were compared with respect to a minimum energy spread of the 229Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting 228Th recoil ions from 232U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.

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Section: Self-adsorptionmentioning

confidence: 97%

Alpha spectrometric characterization of thin ²³³U sources for ^229(m)Th production

et al. 2020

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First-principles study on Ga interactions with Pu surfaces and δ-Pu bulk

Shao,

Deng,

Zhang

et al. 2024

Computational Materials Science

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A mechanism of cation diffusion in ThO2 nanocrystal bulk. A molecular dynamic simulation

Seitov¹,

Pitskhelaury²,

Nekrasov³

et al. 2022

The Viii International Young Researchers’ Conference – Physics, Technology, Innovations (Pti-2021)

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Sputtering of material from the surface of PuO2 crystals by collision cascades impact. A molecular dynamics study

Cited by 4 publications

References 46 publications

Alpha spectrometric characterization of thin ²³³U sources for ^229(m)Th production

Alpha spectrometric characterization of thin ²³³U sources for ^229(m)Th production

First-principles study on Ga interactions with Pu surfaces and δ-Pu bulk

A mechanism of cation diffusion in ThO2 nanocrystal bulk. A molecular dynamic simulation

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Sputtering of material from the surface of PuO2 crystals by collision cascades impact. A molecular dynamics study

Cited by 4 publications

References 46 publications

Alpha spectrometric characterization of thin 233U sources for 229(m)Th production

Alpha spectrometric characterization of thin 233U sources for 229(m)Th production

First-principles study on Ga interactions with Pu surfaces and δ-Pu bulk

A mechanism of cation diffusion in ThO2 nanocrystal bulk. A molecular dynamic simulation

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Product

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Alpha spectrometric characterization of thin ²³³U sources for ^229(m)Th production

Alpha spectrometric characterization of thin ²³³U sources for ^229(m)Th production