The film growth of the conjugated organic molecule rubicene
on silicon dioxide was studied in detail. Since no structural data
of the condensed material were available, we first produced high quality
single crystals from solution and determined the crystal structure.
This high purity material was used to prepare ultrathin films under
ultrahigh vacuum conditions, by physical vapor deposition. Thermal
desorption spectroscopy (TDS) was applied to delineate the adsorption
and desorption kinetics. It could be shown that the initial sticking
coefficient is only 0.2 ± 0.05, but the sticking coefficient
increases with increasing coverage. TDS further revealed that first
a closed, weakly bound bilayer develops (wetting layer), which dewets
after further deposition of rubicene, leading to an island-like layer.
These islands are crystalline and exhibit the same structure as the
solution grown crystals. The orientation of the crystallites is with
the (001) plane parallel to the substrate. A dewetting of the closed
bilayer was also observed when the film was exposed to air. Furthermore,
Ostwald ripening of the island-like film takes place under ambient
conditions, leading to films composed of few, large crystallites.
From TDS, we determined the heat of evaporation from the multilayer
islands to be 1.47 eV, whereas the desorption energy from the first
layer is only 1.25 eV.