2011
DOI: 10.1063/1.3543632
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Stability of polarization in organic ferroelectric metal-insulator-semiconductor structures

Abstract: Dielectric measurements have been carried out on all-organic metal-insulator-semiconductor structures with the ferroelectric polymer poly(vinylidenefluoride-trifluoroethylene) as the gate insulator. It is shown that the polarization states remain stable after poling with accumulation and depletion voltage. However, negative charge trapped at the semiconductor-insulator interface during the depletion cycle masks the negative shift in flatband voltage expected during the sweep to accumulation voltages.

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Cited by 23 publications
(15 citation statements)
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References 115 publications
(345 reference statements)
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“…To confirm the ferroelectric property in our devices with d s ¼ 0 (that is, Al/FL/AL structure) and 60 nm, the double-wave method [25][26][27][28][29][30] was utilized to measure ferroelectric hysteresis loops, which can accurately estimate remnant polarization P r and coercive voltage V c . The detailed procedures are as follows.…”
Section: Resultsmentioning
confidence: 99%
“…To confirm the ferroelectric property in our devices with d s ¼ 0 (that is, Al/FL/AL structure) and 60 nm, the double-wave method [25][26][27][28][29][30] was utilized to measure ferroelectric hysteresis loops, which can accurately estimate remnant polarization P r and coercive voltage V c . The detailed procedures are as follows.…”
Section: Resultsmentioning
confidence: 99%
“…However, the cause of such hysteresis is not well understood just as we discussed above. Some researchers argued that the hysteresis was due to bistable positive and negative polarization states of the P(VDF-TrFE) film, [5][6][7] while there were still some consideration that the cause of hysteresis was due to one polarization state and one depolarization state. 10 Furthermore, the whole C-V curves shift toward positive voltage direction, which should be due to the existence of space charges in Al 2 O 3 layer and/or ferroelectric films injected during the electrical application.…”
Section: Resultsmentioning
confidence: 99%
“…19 Furthermore, as for P(VDF-TrFE)/P3HT FeFETs, R. Kalbitz et al argued that the apparent instability of depletion state arose from the development of a negative interfacial charge which more than compensated the ferroelectric-induced shift, resulting in a permanent shift in threshold voltage to positive values. 6,7 All these work indicates the existence of charge injection which shifts the threshold voltage and results in the degradation of retention property in ferroelectric memories. Finally, atmosphere exposure can also influence the retention property of ferroelectric memory devices.…”
Section: -8mentioning
confidence: 99%
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