“…For example, it is well known that at room temperature and an environment of about 7 nm layer of SiO 2 can be formed over time on the surface of silicon. Oxidation, as reported by Bjorkqvist et al, is a very slow process at room temperature and, thus, leads to constant changes in the composition, structure, and physical parameters of PSi layers . Consequently, the properties of highly porous devices based on silicon and PSi, such as electrical resistivity, mechanical strain, and optical properties, such as RI and PL, are not stable over time, especially in the initial stages of operation after manufacture (see Figure ).…”