Stable functionalization of germanium surface and its application in biomolecules immobilization

1-Dodecanethiol based highly stable self-assembled monolayers for germanium passivation

“…Finally, moderate elevated temperature (higher than 60 • C, 80 • C particularly) could significantly improve the quality of NDM SAMs, the corresponding stability was even more than 10 days in water condition, much longer than the data reported [21,30]. Therefore, considering the simplicity of operation, moderate reaction conditions and high quality of the formed alkanethiol SAMs on Ge surface, the optimized thiols functionalization approach in this study might be a proper passivation choice in the future practical application of Ge [9,12,28,48].…”

“…In this context, passivation with thiols SAMs is promising due to the advantage of incorporating a Ge-S bond at the interface. In addition, apart from passivation, thiols SAMs on Ge has the potential to introduce different chemical functional groups, which are essential for the integration of electrical and biochemical applications [27,28]. These potential applications further make thiols a promising functionalization approach.…”

A study on degradation of germanium coating on Kapton used for spacecraft sunshield application

“…In general, thin‐native oxide layer can be formed on Ge even with a little presence of oxygen during its deposition and also exposure of ambient atmosphere mentioned earlier . Several passivation and surface modification techniques like chlorination, fluorination, alkylation, sulfidation, deposition of HfO 2 , Langmuir–Blodgett layer, and so on are employed to prevent, control, or remove oxides from Ge surfaces . Bodlaki et al have reported the chemically removal of the oxide layer on Ge (111) surface and subsequently replacement of it by implementing monolayer of H, Cl, alkyl, and S. Further, they have showed that better passivation is achieved with alkyl‐terminated and S‐terminated surfaces.…”

“…Wolter et al have discussed the surface passivation of porous Ge film by chlorination method. In a recent report by Cai et al , it has been illustrated the removal of surface oxide of Ge by Cl termination and further protected by functionalization of the surface immersing into mercaptoundecanoic acid and isopropyl alcohol solution. Grossi et al have reported oxide layers in Ge nanowires that can be effectively removed by HCl, hydrogen fluoride, and pure H 2 O treatments.…”

“…Although the degradation/oxidation issue of the Ge in general is well reported in the literature, however, in‐depth and systematic studies of its morphology, elemental oxidation states, electrical, thermo‐optical properties, and RF losses have not been thoroughly investigated so far in particular in the preview of spacecraft application. Thus, it is important to study the aging effects of the Ge on Kapton and explore the causes for degradation.…”