Stable Layer Systems with Diffusion Barrier Arrangements in Thin Film Technology

Abstract

The physical and chemical interaction processes in thin film arrangements are followed by different ageing phenomena which influence the stability of their physical paramet.ers. These determine the reliability of the electronic components existing of thin films.On the base of own experimental investigations on tantalum and its oxides, beryllium oxide and tantalum-rhenium alloys tcchnological aspects and the application of new materials for lowering the ageing intensity are considered. @H3HqeCKOe U XIlMMqeCKOe B3aHMOAefiCTBHe B TOHKHX IIJIeHKaX npHBOnHT K pa3JIU' IHbIM (PeHOMeIIaM CTapeHHH, KOTOpbIe BJIHIIIOT Ha CTa6HJIbHOCTb UX (PH3H-YeCKHX 11apaMeTpOB. 3Ta CTa6HJlbHOCTb 0603HaYaeT Hank-KHOCTb 3JleKTPOHHblX npH60pOB, KOTOPbIe COCTORT M 3 3TMX TOHKMX llJleHOK. OKHCJla 6epHJIJIHH H CllJlaBOB TaHTaJla H PeHHfl , aBT0pbI.e PaCaMaTpHBaIOT MeXHO-Ha ocHoBe CBOHX 3IiClIepHMeHTaJII,HbIX mcnexoBaHnZi TaHTaaa EI ero OKEICJIOB, norwiecme acneKTbI H npwMeneHue H O P~I X MaTepaanon n m noHumeHm HHTeH-CHBHOCTH npoueccoe cTapeam.