Staging of RF-accelerating Units in a MEMS-based Ion Accelerator

Persaud, A.; Seidl, P.A.; Ji, Qing; Feinberg, E.; Waldron, W.L.; Schenkel, T.; Ardanuç, Serhan; Vinayakumar, K. B.; Lal, Amit

doi:10.1016/j.phpro.2017.09.040

Cited by 6 publications

(3 citation statements)

References 5 publications

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“…9A). Here, the accelerating wafers and Faraday cup were replaced by glass ESQAs and a scintillator (RP 400 plastic scintillator) together with a fast image intensifying camera (Princeton instruments) [9]. After mounting the ESQA, the positive and negative bias on the ESQA electrodes were swept to observe the focusing/defocusing effect.…”

Section: Experimental Setup For Ion Accelerationmentioning

confidence: 99%

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Demonstration of waferscale voltage amplifier and electrostatic quadrupole focusing array for compact linear accelerators

Vinayakumar

Ardanuç

et al. 2019

Journal of Applied Physics

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Compact linear accelerators with beam energies in the keV to MeV range have applications in medicine, neutron/X-ray generation, surface modifications, etc. The size, weight and power of existing accelerators precludes them from mass availability in portable formats. This paper presents a specific implementation of an ion accelerator architecture based on planar wafers with accelerating and focusing sections. Our low cost approach allows the control of the final ion beam energy with potential applications, for example, for accelerator-based ion implantation. In this paper, we demonstrate two important waferscale modules required to build a linear particle accelerator these include (1) on-wafer voltage amplification for beam acceleration using Inductor-Capacitor (LC) resonators and (2) waferscale electrostatic quadrupole arrays (ESQA) to re-focus the ion beams during transport. On-board LC resonators were developed using a Printed Circuit Board (PCB) fabrication processes to implement an LC element resonant at ~16.6 MHz with a quality factor of 25. An energy gain of ~250 electron volts was observed using a two wafer acceleration unit with an argon ion beam with 6.5 keV initial energy. A 3×3 ESQA was fabricated on a glass wafer with metal electrodes formed by depositing copper metal around the beam apertures. The ESQA was used to focus and defocus an argon ion beam demonstrating a field gradient of ~500 V over a gap of ~250 microns.

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Section: Experimental Setup For Ion Accelerationmentioning

confidence: 99%

“…Using this external resonator (voltage amplifier), an accelerator consisting of six accelerating gaps was demonstrated [9]. The external resonators will increase the size, power and cost of a complete accelerator system.…”

Section: Introductionmentioning

confidence: 99%

Demonstration of waferscale voltage amplifier and electrostatic quadrupole focusing array for compact linear accelerators

Vinayakumar

Ardanuç

et al. 2019

Journal of Applied Physics

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“…In a previous publication we showed that a printed-circuit-board based (PCB) ESQA can be used to focus and accelerate argon ion beams [9,10]. However, the laser microfabrication and side-wall metal deposition processes are not suitable for mass fabrication.…”

Section: Figure 1: (A) 3d Schematic Of Multi-beam Accelerator With Io...mentioning

confidence: 99%

Waferscale electrostatic quadrupole array for multiple ION beam manipulation

Vinayakumar

Persaud

et al. 2018

2018 IEEE Micro Electro Mechanical Systems (MEMS)

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We report on the first through-wafer silicon-based Electrostatic Quadrupole Array (ESQA) to focus high energy ion beams. This device is a key enabler for a waferbased accelerator architecture that lends itself to orders-ofmagnitude reduction in cost, volume and weight of charged particle accelerators. ESQs are a key building block in developing compact Multiple Electrostatic Quadrupole Array Linear Accelerator (MEQALAC) [1]. In a MEQALAC electrostatic forces are used to focus ions, and electrostatic field scaling permits high beam current densities by decreasing the beam aperture size for a given peak electric field set by breakdown limitations. Using multiple parallel beams, each totaling to an area A, can result in higher total beam current compared to a single aperture beam of the same area. Smaller dimensions also allow for higher focusing electric field gradients and therefore higher average beam current density. Here we demonstrate that Deep Reactive Ion Etching (DRIE) micromachined pillar electrodes, electrically isolated by silicon-nitride thin films enable higher performance ESQA with waferscale scalability. The fabricated ESQA are able to hold up to1 kV in air. A 3×3 array of 12 keV argon ion beams are focused in a wafer accelerator unit cell to pave the way for multiple wafer accelerator.

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Source-to-accelerator quadrupole matching section for a compact linear accelerator

Seidl

Persaud

Ghiorso

et al. 2018

Review of Scientific Instruments

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Recently, we presented a new approach for a compact radio-frequency (RF) accelerator structure and demonstrated the functionality of the individual components: acceleration units and focusing elements. In this paper, we combine these units to form a working accelerator structure: a matching section between the ion source extraction grids and the RF-acceleration unit and electrostatic focusing quadrupoles between successive acceleration units. The matching section consists of six electrostatic quadrupoles (ESQs) fabricated using 3D-printing techniques. The matching section enables us to capture more beam current and to match the beam envelope to conditions for stable transport in an acceleration lattice. We present data from an integrated accelerator consisting of the source, matching section, and an ESQ doublet sandwiched between two RF-acceleration units.

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Staging of RF-accelerating Units in a MEMS-based Ion Accelerator

Cited by 6 publications

References 5 publications

Demonstration of waferscale voltage amplifier and electrostatic quadrupole focusing array for compact linear accelerators

Demonstration of waferscale voltage amplifier and electrostatic quadrupole focusing array for compact linear accelerators

Waferscale electrostatic quadrupole array for multiple ION beam manipulation

Source-to-accelerator quadrupole matching section for a compact linear accelerator

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