Standardization method using argon plasma electric on strains of yeast genus Candida (836.7)

Abstract

Fungal sepsis is the leading cause of death among hospitalized patients, 80 % caused by Candida species. The electric plasma has been widely used in the sterilization of materials, and easy handling, fast and safer than current methods of microbial control. The study is focused on the standardization of a technique physicochemical control based on the use of the electric plasma argon ‐ oxygen. Strains of Candida albicans ATCC and clinics, were grown in Sabouraud agar for 24 h at 37 °C and subsequently diluted in sterile saline to 0.9 %, according to the scale 0.5 MacFarland then promptly plated in Sabouraud. The plates were irradiated with plasma DBD (Dieletric Barrier Discharge 04W) at time zero, six and ten minutes and observed after 24 and 48 hours of incubation at 37 ° C. Through this methodology, it was observed that after irradiation of ATCC strains at times of 6 and 10 minutes, there was a reduction in the growth ofCFU 's of 50 and 100%, respectively reducing and of 86 and 95.7 % in clinical strains . The results are shown promise for the use of new techniques for sterilization of hospital supplies and possible application to control fungal biofilms using plasma jet.