Infrared Detectors: State of the Art 1992
DOI: 10.1117/12.138616
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State of the art of Hg-melt LPE HgCdTe at Santa Barbara Research Center

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Cited by 55 publications
(10 citation statements)
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“…Further details on HgCdTe/Si material growth and the DLHJ detector structure design are described elsewhere. [14][15][16] To allow the application of different process variations in fabricating detector arrays, a single 4-in. HgCdTe/Si was diced into smaller sizes prior to wafer processing.…”
Section: Resultsmentioning
confidence: 99%
“…Further details on HgCdTe/Si material growth and the DLHJ detector structure design are described elsewhere. [14][15][16] To allow the application of different process variations in fabricating detector arrays, a single 4-in. HgCdTe/Si was diced into smaller sizes prior to wafer processing.…”
Section: Resultsmentioning
confidence: 99%
“…The use of heterostructures to improve HgCdTe (MCT) infrared detector performance is a well-established practice [31][32][33]. Table 1 Selected properties of common families of semiconductors used in mid-wave and long-wave infrared photodetectors.…”
Section: Unipolar Barriersmentioning
confidence: 99%
“…Four layers (30 cm 2 each) with a total area of 120 cm 2 can be grown in a single run. 42 In the early 90's, bulk growth has been replaced by LPE and now is very mature for production of first-and second-generation detectors. LPE technique has been successfully used in fabrication of DLHJ p-on-n photodiodes (see Fig.…”
Section: Impact Of Epitaxial Growth On Development Of Hgcdte Detectorsmentioning
confidence: 99%