2019
DOI: 10.1016/j.jcrysgro.2019.05.026
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Step bunching phenomena on Si(0 0 1) surface induced by DC heating during sublimation and Si deposition

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Cited by 7 publications
(6 citation statements)
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“…Recently it was found that both current directions across the steps can bunch the W(110) vicinal surface at 1500 °C. surface of an insulator, Al 2 O 3 , 22,34 and recently on Si(001) 31 where, in contrast to previous studies, 28−30 bunching induced at the same temperature by step-up and step-down driving force was observed.…”
Section: Introductionmentioning
confidence: 76%
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“…Recently it was found that both current directions across the steps can bunch the W(110) vicinal surface at 1500 °C. surface of an insulator, Al 2 O 3 , 22,34 and recently on Si(001) 31 where, in contrast to previous studies, 28−30 bunching induced at the same temperature by step-up and step-down driving force was observed.…”
Section: Introductionmentioning
confidence: 76%
“…Summarizing the above, it can be seen that SB is induced by both step-up and step-down external biases, but the process happens at different ranges of adatom concentrations, and the observed SU-induced bunches are less developed than the SD-induced ones. Experimentally, it is also observed that the height of SU-induced bunches is lower for several systems where both SU and SD biases can destabilize the surface. ,, Therefore, the step–step repulsive interaction influences the bunching process in completely different way for SD and SU biases. Below we will continue to analyze the character of the SB in both cases.…”
Section: Resultsmentioning
confidence: 98%
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“…A deep understanding of all of the effects and phenomena that occur during their growth is required to obtain high-quality crystals. A colossal theoretical groundwork devoted to various phenomena on the surface of crystals: nucleation of islands, growth of nanowires, motion of steps, and other effects describes mainly single-component systems. Many gaps exist in the theory of the growth of multicomponent crystals.…”
Section: Introductionmentioning
confidence: 99%