Sterilization of stem‐end rot of mango using dielectric barrier discharge and investigation of sterilization factors

Abstract

To develop a sterilization method for controlling post-harvest stem-end rot of mango, we examined to sterilize fungi on peduncle by using the dielectric barrier discharge (DBD). Additionally, to investigate the sterilization factors, we performed sterilization against stem-end rot on agar medium by using the DBD generated in air, argon gas, or oxygen gas. It was found that the DBD can sterilize fungi with high probability. Ultra-violet ray and O 3 do not contribute to the sterilization. High energy electrons, and radicals such as O and OH play an essential role for the sterilization.