2011
DOI: 10.1017/s0263574711001147
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Stiffness analysis of a compliant precision positioning stage

Abstract: In this paper a 3-degree of freedom compliant parallel positioning stage utilizing flexure hinges is explored for nanoimprint lithography. The performance of the stage is extensively analyzed using a pseudo-rigid body model and finite element method. The position and velocity models are established. Accordingly, the stiffness at driving point of the active arm is obtained on the basis of Castigliano's first theorem. The system stiffness of the compliant stage is explored using the compliant matrix methodology … Show more

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Cited by 11 publications
(9 citation statements)
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“…This guarantees that the CPM can have a linear force-displacement relationship, identical mechanical bandwidth for each axis, and even decoupled kinematic model. Therefore, parallel structure has a great potential to be utilized in the development of a compliant mechanism, and numerous researchers have already begun working on it [12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…This guarantees that the CPM can have a linear force-displacement relationship, identical mechanical bandwidth for each axis, and even decoupled kinematic model. Therefore, parallel structure has a great potential to be utilized in the development of a compliant mechanism, and numerous researchers have already begun working on it [12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…In this research, closed-form equations were produced and a parametric study of the mechanism performance was also carried out. X Jia, et al [11], obtained the input stiffness model of the active arm of a 3-DOF compliant parallel positioning stage on the basis of the Castigliano's first theorem. The matrix method transforms the local compliance of the flexure members to a global frame for easily obtaining the compliance model of the entire mechanism.…”
Section: Introductionmentioning
confidence: 99%
“…1,2 Many researches have been performed to design or analyze the compliant positioning stages in recent years. [3][4][5][6][7][8][9][10][11][12] Hui Tang et al proposed a compliant two degrees of freedom (DOFs) micro-nano positioning stage. 3 Wang Hua et al carried out a deep investigation on the input coupling analysis and optimal design of the three DOFs compliant micro-positioning stage.…”
Section: Introductionmentioning
confidence: 99%
“…5 Qiliang Wang et al paid much attention to the fatigue reliability of planar compliant micropositioning stages. 6 In addition, X. Jia et al, 7 Yangmin Li et al, 8 Kee-Bong Choi et al 9 and so on [10][11][12] made great efforts on the development of compliant positioning stages. With the rapid developments of compliant mechanisms and micro-nano technologies, compliant positioning stages will be more widely applied in the future.…”
Section: Introductionmentioning
confidence: 99%