2019
DOI: 10.1038/s41598-019-54024-1
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Stitchless support-free 3D printing of free-form micromechanical structures with feature size on-demand

Abstract: Femtosecond laser based 3D nanolithography is a powerful tool for fabricating various functional micro- and nano-objects. In this work we present several advances needed to push it from the laboratory level use to the industrial production lines. First, linear stage and galvo-scanners synchronization is employed to produce stitch-free mm-sized structures. Furthermore, it is shown that by varying objective numerical apertures (NA) from 1.4 NA to 0.45 NA, voxel size can be tuned in the range from sub μm to tens … Show more

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Cited by 37 publications
(28 citation statements)
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“…The additional losses could be mitigated by using newer photopolymers for the 3D printing (e.g., PO4 [28] ) that feature better absorption coefficient. Additionally, we expect that scattering from the proposed lens could be reduced by an improvement in the correction of the stitching between different printing areas, or adopting a stitch-less 3D printing system [26] . The scattering from the lens could also be reduced by an improved design of the outer rings in the reflective part of the lens.…”
Section: Discussionmentioning
confidence: 99%
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“…The additional losses could be mitigated by using newer photopolymers for the 3D printing (e.g., PO4 [28] ) that feature better absorption coefficient. Additionally, we expect that scattering from the proposed lens could be reduced by an improvement in the correction of the stitching between different printing areas, or adopting a stitch-less 3D printing system [26] . The scattering from the lens could also be reduced by an improved design of the outer rings in the reflective part of the lens.…”
Section: Discussionmentioning
confidence: 99%
“…"stitching" defects [26] that are generated by the stage backlash error and are visible as a hexagonal pattern in the SEM image of Figure2 .…”
Section: Fabricationmentioning
confidence: 99%
“…We used the femtosecond laser "Carbide" (by Light Conversion), operating at the second harmonic (515 nm), with average power in the range from 0.1 to 10 mW, and a 250 fs pulse duration and repetition rate. More details on the setup can be found in [22]. Additionally, the technology is extremely adaptive for non-standard samples, such as channel systems, optical fibers, and even semiconductors.…”
Section: Step 4-in Situ Laser Writingmentioning
confidence: 99%
“…This possibility also extends to PDMS channel systems prepared previously. Writing inside close channels is possible due to the imaging system integrated into the setup as well as the possibility to use different focusing objective lenses on demand [22]. In this particular work we tested 20 × 0.4 NA (1.5 mm focusing distance, Olympus, Tokyo, Japan) and 20 × 1.4 NA (0.32 mm focusing distance, Carl Zeiss AG, Jena, Germany) lenses.…”
Section: Step 4-in Situ Laser Writingmentioning
confidence: 99%
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