2008
DOI: 10.1063/1.2927481
|View full text |Cite
|
Sign up to set email alerts
|

Stoichiometric growth of high Curie temperature heavily alloyed GaMnAs

Abstract: Heavily-alloyed, 100 nm Ga 1-x Mn x As (x>0.1) films are obtained via low-temperature molecular beam epitaxy utilizing a combinatorial technique which allows systematic control of excess arsenic during growth. Reproducible, optimized electronic, magnetic and structural properties are found in a narrow range of stoichiometric growth conditions. The Curie temperature of stoichiometric material is 150-165 K and independent of x within a large window of growth conditions while substitutional Mn content increases l… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

3
53
0
1

Year Published

2008
2008
2016
2016

Publication Types

Select...
6
4

Relationship

1
9

Authors

Journals

citations
Cited by 62 publications
(57 citation statements)
references
References 20 publications
3
53
0
1
Order By: Relevance
“…This model predicts an increase of Curie temperature with increasing Mn concentration. However, as it was shown, e.g., by Mack et al, 5 the increased Mn content did not raise Curie temperature. At present, the highest observed Curie temperature for (Ga,Mn)As thin films is about 180 K, 6 which is still far from the room temperature.…”
mentioning
confidence: 70%
“…This model predicts an increase of Curie temperature with increasing Mn concentration. However, as it was shown, e.g., by Mack et al, 5 the increased Mn content did not raise Curie temperature. At present, the highest observed Curie temperature for (Ga,Mn)As thin films is about 180 K, 6 which is still far from the room temperature.…”
mentioning
confidence: 70%
“…Inferring doping trends in basic material properties of (Ga,Mn)As from sample series mixing as-grown and annealed materials, as has been often the case in the literature 7,9 , is unsuitable as the quality of the samples may vastly vary in such a series. Chosing one a priori-fixed T G , T A and annealing time for a range of Mn dopings, as is also common in the literature 7,9,16,17 , is unlikely to produce a high-quality, uniform and uncompensated (Ga,Mn)As material even for one of the considered dopings and is bound to produce lower quality samples for most of the studied Mn dopings. Finally, reliable measurements of intrinsic semiconducting and magnetic properties on optimized (Ga,Mn)As samples require exceedingly long annealing times for film thicknesses \50 nm and are unachievable in B100 nm and thicker films by the known approaches to the (Ga,Mn)As epilayer synthesis.…”
Section: Resultsmentioning
confidence: 99%
“…The films were prepared using the non-rotated, low-temperature growth techniques reported in Refs. 19,39 . Since this study involved several doping regimes, details of the growth vary between samples.…”
Section: A Sample Growth and Characteristicsmentioning
confidence: 99%