2022
DOI: 10.1016/j.tsf.2022.139147
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Strain and annealing temperature effects on the optical properties of GaNAs layers grown by molecular beam epitaxy

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Cited by 2 publications
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“…Consequently, many growth techniques are used to prepare ultrathin III-V-N alloys, MQWs and superlattices (SLs) on different (Si, GaAs, InAs, InP) substrates by exploiting gas-source molecular beam epitaxy (GS-MBE), [40][41][42][43][44], hydride vapor phase epitaxy (HVPE) [45], liquid phase epitaxy (LPE), chemical beam epitaxy (CBE), atmosphericpressure metal-organic vapor-phase epitaxy (AP-MOVPE) and low-pressure MOVPE (LP-MOVPE) [46][47][48]. As the importance of these materials for designing different device structures in photonic applications is intensified, so are the obligations of many scientists and engineers to characterize them by using nondestructive experimental techniques [49][50][51][52].…”
Section: Introductionmentioning
confidence: 99%
“…Consequently, many growth techniques are used to prepare ultrathin III-V-N alloys, MQWs and superlattices (SLs) on different (Si, GaAs, InAs, InP) substrates by exploiting gas-source molecular beam epitaxy (GS-MBE), [40][41][42][43][44], hydride vapor phase epitaxy (HVPE) [45], liquid phase epitaxy (LPE), chemical beam epitaxy (CBE), atmosphericpressure metal-organic vapor-phase epitaxy (AP-MOVPE) and low-pressure MOVPE (LP-MOVPE) [46][47][48]. As the importance of these materials for designing different device structures in photonic applications is intensified, so are the obligations of many scientists and engineers to characterize them by using nondestructive experimental techniques [49][50][51][52].…”
Section: Introductionmentioning
confidence: 99%