2013
DOI: 10.1063/1.4855436
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Strain and composition effects on Raman vibrational modes of silicon-germanium-tin ternary alloys

Abstract: We investigated Raman vibrational modes in silicon-germanium-tin layers grown epitaxially on germanium/silicon virtual substrates using reduced pressure chemical vapor deposition. Several excitation wavelengths were utilized to accurately analyze Raman shifts in ternary layers with uniform silicon and tin content in 4–19 and 2–12 at. % ranges, respectively. The excitation using a 633 nm laser was found to be optimal leading to a clear detection and an unambiguous identification of all first order modes in the … Show more

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Cited by 71 publications
(78 citation statements)
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“…shows the Raman spectra obtained with the same acquisition conditions and normalized to the Ge-Ge phonon mode intensity, for three samples, bulk c-Ge (wafer), reference layer of germanium without Sn (#0) and GeSn sample #6 (the one with the highest Sn content). According to the previous studies[11-14, 27, 33-35], for this system it is expected to observe several Raman features, namely: (i) Ge-Ge phonon mode (near 300 cm -1 ), either from the GeSn layers or from the Ge buffer layer or both, (ii) the TO-LO phonon mode of the Si substrate (521 cm -1 ), (iii) a vibration mode due to the Ge-Sn bonds (around 260 cm -1 ), and (iv) possibly a weak band around 185 cm -1 , which has been tentatively attributed to Sn-Sn vibrations by some authors[11], supported mostly by its proximity to the Γ point TO-LO phonon mode in grey tin[46].FromFig. 8it is seen that the reference sample (without tin) exhibits the Ge-Ge phonon mode (the only one seen for the c-Ge) and also the bulk Si-Si phonon mode from the substrate (≈ 520 cm -1 ).…”
mentioning
confidence: 86%
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“…shows the Raman spectra obtained with the same acquisition conditions and normalized to the Ge-Ge phonon mode intensity, for three samples, bulk c-Ge (wafer), reference layer of germanium without Sn (#0) and GeSn sample #6 (the one with the highest Sn content). According to the previous studies[11-14, 27, 33-35], for this system it is expected to observe several Raman features, namely: (i) Ge-Ge phonon mode (near 300 cm -1 ), either from the GeSn layers or from the Ge buffer layer or both, (ii) the TO-LO phonon mode of the Si substrate (521 cm -1 ), (iii) a vibration mode due to the Ge-Sn bonds (around 260 cm -1 ), and (iv) possibly a weak band around 185 cm -1 , which has been tentatively attributed to Sn-Sn vibrations by some authors[11], supported mostly by its proximity to the Γ point TO-LO phonon mode in grey tin[46].FromFig. 8it is seen that the reference sample (without tin) exhibits the Ge-Ge phonon mode (the only one seen for the c-Ge) and also the bulk Si-Si phonon mode from the substrate (≈ 520 cm -1 ).…”
mentioning
confidence: 86%
“…phonon-related thermal conductivity of SixGe1-x crystals [23]. They are much less expensive in terms of computation time and well suited for modelling effects of strain relaxation in alloys where the end members have different lattice constants [24][25][26], as it is the case of the system under consideration in this work [11,12,27].…”
Section: Introductionmentioning
confidence: 99%
“…The samples investigated in this work were grown using a metal cold-wall reduced pressure chemical vapor deposition (CVD) [10,25,26] [27]. Fig.1(a) shows the STEM images of the layer with highest Sn content Si .…”
mentioning
confidence: 99%
“…The calculation of the angular frequency of the phonons involved in the SRS process represents a preliminary step toward the overall model execution. To this purpose, some authors have recently demonstrated that the experimental Raman shift in bulk Ge matches the following relationship with a very good agreement [23]:…”
Section: Numerical Resultsmentioning
confidence: 75%