2014
DOI: 10.1021/nl501480f
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Strain Dynamics of Ultrathin VO2 Film Grown on TiO2 (001) and the Associated Phase Transition Modulation

Abstract: Tuning the metal insulator transition (MIT) behavior of VO2 film through the interfacial strain is effective for practical applications. However, the mechanism for strain-modulated MIT is still under debate. Here we directly record the strain dynamics of ultrathin VO2 film on TiO2 substrate and reveal the intrinsic modulation process by means of synchrotron radiation and first-principles calculations. It is observed that the MIT process of the obtained VO2 films can be modulated continuously via the interfacia… Show more

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Cited by 256 publications
(218 citation statements)
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“…Major differences seem to occur during the cooling process. Actually, looking at the hysteresis curves of similar films, this result is not unexpected [8]. The 16 nm thick film (Figure 3a in [6]) exhibits an MIT transition just above 30 • C, and the transition to the metallic state is almost completed at~70 • C. While cooling, the transition starts around~60 • C and is almost completed at~30 • C. experiments performed in transmission, as in [21], where a film of 40 nm of VO2 obtained by oxidizing a thin film of vanadium on a silicon nitride membrane has been measured.…”
Section: Resultsmentioning
confidence: 79%
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“…Major differences seem to occur during the cooling process. Actually, looking at the hysteresis curves of similar films, this result is not unexpected [8]. The 16 nm thick film (Figure 3a in [6]) exhibits an MIT transition just above 30 • C, and the transition to the metallic state is almost completed at~70 • C. While cooling, the transition starts around~60 • C and is almost completed at~30 • C. experiments performed in transmission, as in [21], where a film of 40 nm of VO2 obtained by oxidizing a thin film of vanadium on a silicon nitride membrane has been measured.…”
Section: Resultsmentioning
confidence: 79%
“…We report here the investigation of a 16 nm film grown on TiO 2 substrate and, as deeply discussed in [8] for films of similar thickness from 1.6 nm to 74 nm grown on an oriented TiO 2 substrate, the role of the interfacial strain is important. Actually, in ultrathin films, i.e., thinner than 10 nm, a fully strained behavior is observed with an MIT temperature near room temperature, while thicker films, i.e., greater than 24 nm, are characterized by diffraction patterns that point out an almost fully relaxed interface, higher MIT transition temperatures, and lower resistance in the metallic state [6].…”
Section: Resultsmentioning
confidence: 91%
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“…[5][6][7] The normal triggering MIT process of VO 2 material is temperature and much effort has been devoted to decrease the critical temperature of VO 2 for satisfying the practical applications. [8][9][10][11] Recently, several groups [12][13][14][15] have reported the possibility of triggering the MIT phase transition through the route of external dc voltage/current added on two-terminal VO 2 based devices. Those experiments produce much excitement because it seems to open an easily controlled way other than temperature for phase transition modulation as well as inducing new functionalities into VO 2 materials.…”
Section: Introductionmentioning
confidence: 99%