2018
DOI: 10.1364/ome.8.001100
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Strain-related recombination mechanisms in polar InGaN/GaN MQWs on amorphous SixC1-x buffers

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Cited by 8 publications
(6 citation statements)
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“…Picosecond times have been reported, , which are much shorter than the ones for c -plane InGaN/GaN quantum wells (∼1.5 ns at 300 K) . Similar values (21–35 ps) have been found for polarization-free InGaN/GaN multiquantum wells (MQWs) wires at 300 K. , In addition, carrier decay rates that deviate from the single-exponential curves were revealed, indicating multiple carrier localization effects present in core–shell InGaN/GaN heterostructures . While ensembles of wires are often investigated by time-resolved photoluminescence (TRPL), , to date only little attention has been paid to carrier decay rates in single wires using more sophisticated approaches, like time-resolved cathodoluminescence (TRCL) and ultrafast optical microscopy .…”
mentioning
confidence: 66%
“…Picosecond times have been reported, , which are much shorter than the ones for c -plane InGaN/GaN quantum wells (∼1.5 ns at 300 K) . Similar values (21–35 ps) have been found for polarization-free InGaN/GaN multiquantum wells (MQWs) wires at 300 K. , In addition, carrier decay rates that deviate from the single-exponential curves were revealed, indicating multiple carrier localization effects present in core–shell InGaN/GaN heterostructures . While ensembles of wires are often investigated by time-resolved photoluminescence (TRPL), , to date only little attention has been paid to carrier decay rates in single wires using more sophisticated approaches, like time-resolved cathodoluminescence (TRCL) and ultrafast optical microscopy .…”
mentioning
confidence: 66%
“…Следует отметить, что до наших исследований не было сообщений о росте монокристаллических эпитаксиальных пленок GaN на темплейтах типа SiC/por-Si. Использование карбида кремния в качестве буфера для высококачественной эпитаксии GaN весьма перспективно, и, как уже было показано в целом ряде работ, на основе SiC/c-Si темплейтов могут быть созданы высокоэффективные светодиоды [48,49].…”
Section: обсуждение полученных результатовunclassified
“…Membrane separation processes have been widely utilized, for example, the InGaN LED layers has been separated from the Al 2 O 3 substrates through the laser lift-off process, , the chemical lift-off process, and chemical-free transfer process . InGaN-based LEDs grown on Si substrates has been lifted-off through the dry etching process and the wet etching process on Si substrates. The device structures separated from gallium arsenide (GaAs) substrates have been reported through the surface tension-assisted epitaxial lift-off process .…”
Section: Introductionmentioning
confidence: 99%