Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Abstract

Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.

Polyferrocenylsilanes: synthesis, properties, and applications

“…294 The ability of PFS BCP to generate catalytically-active Fe nanoparticles for the formation of SWCNTs is significantly greater than that shown by PFS homopolymers. 204,288,[299][300][301][302][303][304][305] BCPs with a metalloblock have garnered significant attention with respect to the formation of nanotemplates. 296 Multi-walled carbon nanotubes (MWCNTs) have been grown off of PS-b-PFEMS films by an analogous method using a plasma treatment approach.…”

Area Selective Polymer Brush Deposition

“…First, it allowed a relatively direct comparison study to the PS‐NH 2 ( M w = 10 kg mol −1 ) described as it possesses a similar molecular weight (P2VP‐NH 2 , M w = 12 kg mol −1 ). Importantly, the reactive P2VP polymer allows the incorporation of metal ions from ethanolic precursor solutions to form metal oxide features, e.g., NiO, Fe 2 O 3 , Al 2 O 3 , Co 3 O 4 . We believe that this process, whereby the deposited brush can act as the “activated” area of subsequent inorganic inclusion or deposition brings a simplified approach to ASD research, and is the first of its kind.…”

A strategy to enhance CO2 permeability of well-defined hyper-branched polymers with dense polyoxyethylene comb graft

“…In particular, self-assembly of BCPs upon microphase separation has been studied intensively [1,2], and the resulting nanoarchitectures have been utilized for biomedical applications [3,4], various nanotechnologies including nanolithography [5,6], and separation membranes [7]. POE-containing block copolymers (for example Pebax, a linear multiblock of POE and poly(ester-amide) segments) have been developed as membrane materials for CO 2 capture [8][9][10] due to the inherent CO 2 -philic nature of POE [11].…”