1987
DOI: 10.1103/physrevlett.59.1037
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Stretched-exponential relaxation arising from dispersive diffusion of hydrogen in amorphous silicon

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Cited by 612 publications
(267 citation statements)
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“…33 It is suggested that these relaxations can be ascribed to Arrhenius type behavior with a distribution of diffusion-site energies. 34 Detailed electronic structure calculations are still necessary to clarify the role of hydroxyls for a particular oxide.…”
Section: Discussionmentioning
confidence: 99%
“…33 It is suggested that these relaxations can be ascribed to Arrhenius type behavior with a distribution of diffusion-site energies. 34 Detailed electronic structure calculations are still necessary to clarify the role of hydroxyls for a particular oxide.…”
Section: Discussionmentioning
confidence: 99%
“…For bulk a-Si:H material, defect reduction following stretched exponentials was explained in the past as arising either from dispersive (i.e. time dependent) hydrogen diffusion [3], or from retrapping included hydrogen motion [4]. For the a-Si:H(i) / c-Si interface, based on the latter interpretation, it has been argued that the annealing induced passivation may originate from a transfer of hydrogen from a higher hydride state in the a-Si:H film (close to the interface) to a monohydride cSi surface state [5].…”
Section: Intrinsic A-si:h Film Passivationmentioning
confidence: 99%
“…In the present study we assume γ = 1/2. The stretched exponential function describes relaxation phenomena in random systems [29,30] and can be attributed to a dispersive transport of mobile defects in the glass [31]. The dispersive transport is characterized by the infinite average time between subsequent hops.…”
Section: B Stretched Exponential Covariancementioning
confidence: 99%