Abstract. Magnetoresistance in two-dimensional array of Ge/Si was studied for a wide range of the conductance, where the transport regime changes from hopping to diffusive one. The behavior of magnetoresistance is similar for all samples; it is negative in weak fields and becomes positive with increasing of magnetic field. Negative magnetoresistance can be described in the frame of weak localization approach with suggestion that quantum interference contribution to the conductance is restricted not only by the phase breaking length but also by the localization length.
IntroductionOur previous study of temperature dependence of conductance and its non-linearity in 2D Ge/Si quantum dot (QD) array [1] showed that change of the structural parameters of the system results in the transition from strong (SL) to weak localization (WL) behavior and, respectively, from hopping to diffusive transport. Different transport regimes should be characterized by different behavior of magnetoresistance (MR). The classical theory for hopping MR predicts a positive MR due to the shrinkage of the impurity wave functions in magnetic field which leads to the decrease of the overlap between localized states and thus reduces the hopping probability [2]. Negative MR is well known at WL [3], where the interference among multiple elastic scattering paths of a single conducting electron leads to the enhancement of the backscattering probabilities. A phase shift in the electron wave function introduced by magnetic field suppresses the coherent backscattering and produces the negative MR. Negative MR was also found for variable-range hopping (VRH) [4], but the mechanism of this effect has different nature. In VRH interference the backscattering gives a negligible contribution to negative MR and the major source of the effect is destructive interference between the forward paths [5].In this paper we describe the results of MR measurements performed on 2D Ge/Si QD system in which the localization strength can be adjusted by variation of QD occupancy, QD array density and under the annealing at 480÷625 • C. For the samples under study the range of the conductances at 4.2 K is approximately 10 −5 ÷10 −10 Ohm −1 .