2001
DOI: 10.1134/1.1345155
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Strongly modulated conductivity in a perovskite ferroelectric field-effect transistor

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Cited by 6 publications
(20 citation statements)
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“…The field interaction between the surface charge of ferroelectric remnant polarization and the charge carriers in the semiconductor film led to either depletion or enrichment of the semiconductor near-surface region, with the corresponding change in conductivity of the resistor. According to published data [5][6][7], an effective operation of such structures is directly related to a partial screening of the polarization by charges localized in surface states at the ferroelectric-semiconductor interface. As a result, the change in conductivity is significantly smaller than expected.…”
Section: Resultsmentioning
confidence: 98%
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“…The field interaction between the surface charge of ferroelectric remnant polarization and the charge carriers in the semiconductor film led to either depletion or enrichment of the semiconductor near-surface region, with the corresponding change in conductivity of the resistor. According to published data [5][6][7], an effective operation of such structures is directly related to a partial screening of the polarization by charges localized in surface states at the ferroelectric-semiconductor interface. As a result, the change in conductivity is significantly smaller than expected.…”
Section: Resultsmentioning
confidence: 98%
“…Despite obvious advantages of such structures, considerable technological problems have been encountered in their fabrication. These difficulties are attributed in part to the physico-chemical compatibility of these thin films and hinder still the creation of thin-film ferroelectric-semiconductor devices for effective control and possessing reproducible characteristics [3][4][5][6][7]. Numerous variations of the transistor structures with ferroelectric gates were obtained by depositing a ferroelectric film onto a silicon substrate [1,3,4] or by combining ferroelectric and semiconductor films [5][6][7].…”
Section: Introductionmentioning
confidence: 99%
“…Oxide perovskite materials, such as AMnO 3 , [11,67] ATiO 3 , [6,12,14,[68][69][70][71][72][73][74] A 2 CuO 4 , [75] ATaO 3 , [76,77] and ASnO 3 , [15] can be used as active layers in FETs. The electron mobility values measured in a FET device for oxide perovskite materials are summarized in Figure 2a.…”
Section: Oxide Perovskite As N-and P-type Channelsmentioning
confidence: 99%
“…The spin-precession length of electrons, which can be modified by the gate voltage, can be as short as tens of nm at large V G . [75] In this device, the channel conductivity was controlled by the hopping mechanism with variable jump length and determined by the Coulomb gap at the Fermi level. [77] Different perovskite structured materials, such as BaSnO 3 and LaCuO 4 , were also applied for FETs.…”
Section: Oxide Perovskite As N-and P-type Channelsmentioning
confidence: 99%
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