Abstract:Thin films of AlN doped with Titanium are deposited on Si(100) and Si(111) substrates and optical fibers at liquid nitrogen temperature by rf-magnetron sputtering. Thickness of the films is 400 nm on both silicon substrates and optical fibers. X-ray diffraction studies show that films deposited on both Si(100) and Si(111) substrate are amorphous, and those deposited on optical fibers are crystalline under the same conditions. The results indicate that low temperature is not the only requirement to grow amorpho… Show more
In this article, we predominantly report the investigation of the local crystal structure around a Ti dopant by X-ray absorption spectroscopy (XAS) and the nano-mechanical properties of co-sputtered Al1−xTixN (x = 0 to 4%) thin films.
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