2010
DOI: 10.1007/s00339-010-6156-4
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Structural and electrical properties of sol–gel derived Ge nanocrystals in SiO2 films

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Cited by 9 publications
(4 citation statements)
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“…Ge-NCs have been synthesized by a variety of chemical and physical approaches. Free-standing Ge-NCs show promise in applications such as Bragg reflectors, light-emitting diodes, solar cells, and biological imaging , by virtue of their high refractive index and PL that extends well into the near-IR. Oxide-embedded Ge-NCs have been investigated for use in optical devices ,,,, as well as nonvolatile memory, ,, where the smaller band gap, larger Bohr exciton radius, and lower carrier effective masses compared to Si offer fast switching and write/erase speeds.…”
Section: Introductionmentioning
confidence: 99%
“…Ge-NCs have been synthesized by a variety of chemical and physical approaches. Free-standing Ge-NCs show promise in applications such as Bragg reflectors, light-emitting diodes, solar cells, and biological imaging , by virtue of their high refractive index and PL that extends well into the near-IR. Oxide-embedded Ge-NCs have been investigated for use in optical devices ,,,, as well as nonvolatile memory, ,, where the smaller band gap, larger Bohr exciton radius, and lower carrier effective masses compared to Si offer fast switching and write/erase speeds.…”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7][8]12,[15][16][17][18] Since it was shown that the fabrication techniques 19 and undesired Ge-O interaction 9 can affect the optical properties, we induced the formation of Ge NCs by implanting Ge ions in Si 3 N 4 or SiO 2 matrices and annealing. Implant energy (100 keV) and fluences (2.9À9.6 Â 10 16 Ge ions/cm 2 ) were chosen to induce the NC precipitation within 90 nm from the surface.…”
mentioning
confidence: 99%
“…Moreover, only charge trapping is observed when a discrete distribution of Ge NPs is introduced inside the matrix oxide layer with a Δ V FB shift to negative voltage values, indicating that additional positive charges (holes) from the Si substrate were collected inside the Ge NPs in the state of accumulation 13. The effective density of trapped charges ( N ch ) was calculated from the experimental values using the following equation 15:…”
Section: Resultsmentioning
confidence: 99%