2005
DOI: 10.1007/s10853-005-1994-8
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Structural and electrochemical studies of Co oxide films formed by the sol-gel technique

Abstract: Two different types of Co oxide films, each having a distinct electrochemical signature correlated with the film drying temperature, were formed using the sol-gel (SG) technique. Two different states of gelation of the film precursor were also explored. Cyclic voltammograms, collected in alkaline solutions for the low temperature films, displayed two pairs of peaks corresponding to the Co(ll) to Co(lll) and Co(lll) to Co(IV) transitions, centered at 1.2 and 1.4 V, respectively, while the high temperature films… Show more

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Cited by 23 publications
(16 citation statements)
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“…To this regard, actual challenging issues concern the devising and optimization of synthetic strategies towards high purity nanomaterials with specific features, opening new frontiers not only for understanding their fundamental properties, but also for developing new generation nanodevices with improved performances. [1][2][3][4][5][6] Nanostructured Co 3 O 4 , the most stable cobalt oxide with a spinel-type structure comprising both Co(II) and Co(III), is an important p-type semiconductor (direct optical bandgaps at z1.5 and 2.0 eV) 5,[7][8][9][10][11][12][13] for applications in secondary Li/O 2 cells, negative electrodes for Li-ion batteries and supercapacitors, 11,12,[14][15][16][17][18][19][20] as well as in field emitters, 6,16,21 heterogeneous catalysts, electrochromic devices, solar absorbers, solid-state sensors, 2,3,5,8,9,13,[17][18][19][22][23][24][25][26][27][28][29][30]…”
Section: Introductionmentioning
confidence: 99%
“…To this regard, actual challenging issues concern the devising and optimization of synthetic strategies towards high purity nanomaterials with specific features, opening new frontiers not only for understanding their fundamental properties, but also for developing new generation nanodevices with improved performances. [1][2][3][4][5][6] Nanostructured Co 3 O 4 , the most stable cobalt oxide with a spinel-type structure comprising both Co(II) and Co(III), is an important p-type semiconductor (direct optical bandgaps at z1.5 and 2.0 eV) 5,[7][8][9][10][11][12][13] for applications in secondary Li/O 2 cells, negative electrodes for Li-ion batteries and supercapacitors, 11,12,[14][15][16][17][18][19][20] as well as in field emitters, 6,16,21 heterogeneous catalysts, electrochromic devices, solar absorbers, solid-state sensors, 2,3,5,8,9,13,[17][18][19][22][23][24][25][26][27][28][29][30]…”
Section: Introductionmentioning
confidence: 99%
“…The sol precursors was deposited on a platinum (Pt) sputtered glass substrate, with surface area ranging between 0.1 and 0.5 cm 2 , by a dip coating procedure [51], where the substrate was immersed into the sol-gel precursor then withdrawn at a constant rate of 1.2-24 cm/min to vary the film thickness. The film was placed in a pre-heated oven at 50 • C and this temperature was maintained for 30 min to remove methanol.…”
Section: Fabrication Of the Thin Films Onto The Platinum-sputtered Sumentioning
confidence: 99%
“…Cobalt and cobalt oxides films have been synthesized by a variety of different methods including spray pyrolysis [11, 12], electron-beam evaporation [13], sol-gel technique [14, 15], and more recently chemical vapor deposition (CVD) [16]. In fact, CVD is the preferred method for direct deposition of thin films of metals on specific structures and substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Cobalt oxides have attracted a considerable amount of attention in the recent years for extensive applications including electronics and sensing [ 1 , 2 ], catalysts [ 3 ], and biomedical devices [ 4 , 5 ] due to their superior properties, such as high saturation magnetization [ 6 , 7 ], stable catalytic activity [ 8 ], and excellent electrochemical performance [ 9 , 10 ]. Cobalt and cobalt oxides films have been synthesized by a variety of different methods including spray pyrolysis [ 11 , 12 ], electron-beam evaporation [ 13 ], sol-gel technique [ 14 , 15 ], and more recently chemical vapor deposition (CVD) [ 16 ]. In fact, CVD is the preferred method for direct deposition of thin films of metals on specific structures and substrates.…”
Section: Introductionmentioning
confidence: 99%