Growth of textured and low-resistivity metallic seed
layers for
AlN-based piezoelectric films is of high importance for bulk acoustic
wave resonator applications. Through optimization of Mo physical vapor
deposition parameters, namely, the Ar flow rate, strong (110) texturing
and low electrical resistivities (∼3 × 10–7 Ω m) were observed for 43 ± 3 nm thick Mo films on a
CVD-grown MoS2 monolayer on c-Al2O3(0001) substrates. The strong texturing was attributed
to the growth template effect of the monolayer MoS2 due
to the presence of a local epitaxial relationship between (110)-Mo
and (0001)-MoS2 (i.e., through MoS2(0001)[112̅0]||Mo(110)[1̅11]
and/or MoS2(0001)[112̅0]||Mo(110)[001]), coupled
with an atomic-scale flatness of the MoS2 surface, which
promotes layer-by-layer growth of the Mo film. The deposited Mo/MoS2 monolayer stack can also be easily peeled-off from the growth
Al2O3(0001) substrate for possible subsequent
transfers onto arbitrary substrates (e.g., SiO2/Si(001))
due to a weak van der Waals coupling at the MoS2 and Al2O3(0001) interface, facilitating vertical stacking
strategies for monolithic integration of high quality and therefore
high-performance, AlN-based piezoelectric devices and sensors on the
Si platform.