2021
DOI: 10.21272/jnep.13(5).05015
|View full text |Cite
|
Sign up to set email alerts
|

Structural and Morphological Characterization of CuO Nanostructure Precipitated by Water-soluble Copper (II) Nitrate Hemi(pentahydrate) and NaOH as Reactants

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 18 publications
0
1
0
Order By: Relevance
“…Recently, semiconductor nanomaterial synthesis has gained enormous attention from the research community due to the formation of very small particle sizes in the nanoscale range between 1 and 100 nm. The semiconductor nanomaterials also exhibit unique properties that are different from bulk materials ascribed to the quantum confinement effect, which contributes to the improvement of electromagnetic radiation, optical properties, mechanical strength, thermal stability, energy storage, photocatalytic degradation, etc [ [1] , [2] , [3] , [4] , [5] ]. Cadmium sulfide (CdS) belongs to the II-VI group chalcogenide binary semiconductor family with a wide direct band gap of around 2.42 eV.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, semiconductor nanomaterial synthesis has gained enormous attention from the research community due to the formation of very small particle sizes in the nanoscale range between 1 and 100 nm. The semiconductor nanomaterials also exhibit unique properties that are different from bulk materials ascribed to the quantum confinement effect, which contributes to the improvement of electromagnetic radiation, optical properties, mechanical strength, thermal stability, energy storage, photocatalytic degradation, etc [ [1] , [2] , [3] , [4] , [5] ]. Cadmium sulfide (CdS) belongs to the II-VI group chalcogenide binary semiconductor family with a wide direct band gap of around 2.42 eV.…”
Section: Introductionmentioning
confidence: 99%