2010
DOI: 10.1016/j.apsusc.2010.05.087
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Structural and morphological study of ZnO thin films electrodeposited on n-type silicon

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Cited by 13 publications
(14 citation statements)
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“…This behavior can be related to changes of the morphology of ZnO deposits, as already mentioned in previous papers [35,36]. Further experiments were then made on the optimized ZnO electrode obtained at -1.1 V during 5 min.…”
Section: Effect Of the Deposition Time On The Electrocatalytic Oxidatsupporting
confidence: 54%
“…This behavior can be related to changes of the morphology of ZnO deposits, as already mentioned in previous papers [35,36]. Further experiments were then made on the optimized ZnO electrode obtained at -1.1 V during 5 min.…”
Section: Effect Of the Deposition Time On The Electrocatalytic Oxidatsupporting
confidence: 54%
“…Electrochemical deposition (ECD) is emerging as an important method to prepare semiconductor thin films such as ZnO; this method presents interesting characteristics for large-area, low-cost, generally low-temperature and soft processing of materials. This technique allows also an easy control of the dimensions of nanostructures by means of appropriate growth parameters [10,11].…”
Section: Introductionmentioning
confidence: 99%
“…The one-step electrodeposition of ZnO films has been extensively reported [10], using oxygen dissolved in an aqueous solution at 70°C. Izaki and Omi [12] were the first to report ZnO formation at the cathode by using nitrate ions as oxygen precursor.…”
Section: Introductionmentioning
confidence: 99%
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“…Six peaks appear in the diffraction spectrum in the 2θ interval of 30-65 o , and correspond to (100), (002), (101), (102), (110) and (103) orientations of the ZnO hexagonal structure. The film formed is polycrystalline with a preferential orientation of the (002) diffraction peak, showing that the film is preferentially oriented in the c-axis direction, which indicates that this axis in the ZnO film tends to grow perpendicular to the substrate surface (Ahmed et al, 2010). In the XRD pattern, characteristic peaks of the (111) Au substrate also appears by comparison with JCPDS 065-2870 card.…”
Section: Characterization Of the Filmmentioning
confidence: 81%