Structural and optical characterization of GaAs and InGaAs thin films deposited by RF magnetron sputtering

Bernal-Correa, Roberto; Gallardo-Hernández, S.; Cardona-Bedoya, Jairo; Pulzara-Mora, A.

doi:10.1016/j.ijleo.2017.08.042

Cited by 8 publications

(2 citation statements)

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“…The aim of these nanostructure preparation alternatives is to obtain good structural quality III-V semiconductors compatible with traditional semiconductor technology [13][14][15][16]. The success of these efforts will translate in the production of low-cost optical devices, compared with some widely used epitaxial techniques, such as molecular-beam epitaxy (MBE) [17][18][19][20][21][22][23].…”

Section: Centro De Investigación Ymentioning

confidence: 99%

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Structural and optical study of alternating layers of In and GaAs prepared by magnetron sputtering

et al. 2019

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Currently, the obtention of nano-structures based on III-V materials is expensive. This calls for novel and inexpensive nanostructure manufacturing approaches. In this work we report on the manufacture of a nanostructures consisting of alternating layers of In and GaAs on a silicon substrate by magnetron sputtering. Furthermore, we characterized the produced nanostructures using secondary ion mass spectroscopy (SIMS), X-ray diffraction analysis, and Raman spectroscopy. SIMS revealed variation in the concentration of In atoms across In/GaAs/In interphases, and X-ray diffraction revealed planes corresponding to phases associated with GaAs and InAs due to In interfacial diffusion across GaAs layers. Finally, in order to study the composition and crystalquality of the manufactured nanostaructures, Raman spectra were taken using laser excitation lines of 452 nm, 532 nm, and 562 nm at different points across the nanostructures.This allowed to determine the transverse and longitudinal optical modes of GaAs and InAs,characteristic of a two-mode behavior. An acoustic longitudinal vibrational mode LA(Γ) of GaAs and an acoustic longitudinal mode activated by disorder (DALA) were observed. These resulted from the substitution of Ga atoms for In atoms in high concentrations due to the generation of Ga(VGa) and/or Arsenic(VAs) vacancies.This set of analyses show that magnetron sputtering can be aviable and relatively low-cost technique to obtain this type of semiconductors.

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Section: Centro De Investigación Ymentioning

confidence: 99%

“…With this technique semiconductor layers can be deposited on monocrystalline, polycrystalline, and/or amorphous substrates. However, reports on the use of this technique for the growth of polycrystalline III-V semiconductors are scarce [30,31].…”

Section: Centro De Investigación Ymentioning

confidence: 99%