2021
DOI: 10.1590/0104-1428.210043
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Structural and optical properties o plasma-deposited a-C:H:Si:O:N films

Abstract: Thin a-C:H:Si:O:N films were deposited from plasmas fed hexamethyldisiloxane, oxygen and nitrogen, and characterized as a function of the partial pressure of oxygen in the feed, R ox . Deposition rates varied from 10 to 27 nm min -1 . Surface roughness was independent of R ox , being around 10 nm. The films contain C=C and C=O, and also Si-C and Si-O-Si groups. Lower [C] and [N] but greater [O] and [Si] were measured in the films as R ox was increased. Refractive indices of ~ 1.5 and optical energy gaps which… Show more

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Cited by 5 publications
(3 citation statements)
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“…Galvan et al [37] pointed out that these measures are crucial to determining the toughness and wear resistance of coatings. The notion that a material's wear resistance can be customized by modifying its elastoplastic properties, often indicated by increasing its hardness or reducing its elastic modulus, is widely acknowledged by Lopes et al [38]. H 3 /E 2 is linked with a material's elastic limit.…”
Section: Nanoindentation Testsmentioning
confidence: 99%
“…Galvan et al [37] pointed out that these measures are crucial to determining the toughness and wear resistance of coatings. The notion that a material's wear resistance can be customized by modifying its elastoplastic properties, often indicated by increasing its hardness or reducing its elastic modulus, is widely acknowledged by Lopes et al [38]. H 3 /E 2 is linked with a material's elastic limit.…”
Section: Nanoindentation Testsmentioning
confidence: 99%
“…H 3 /E 2 is used as an indicator of toughness given that it is related to the elastic limit of the material. Thus, an improvement in the elastic recovery of the coating, which is related to its toughness, will cause an increase in this ratio [57][58][59]. Furthermore, the relationship between these parameters and wear resistance has also been studied, proving that H/E and H 3 /E 2 are more relevant than just hardness in determining good wear resistance of coatings [56,57,59,60].…”
Section: Nanoindentationmentioning
confidence: 99%
“…O hexametildisiloxano (HMDSO) é um monômero organo-silício de interesse devido a sua alta taxa de deposição e a habilidade de controlar a estrutura e propriedade de filme formado na superfície pela variação das condições de deposição (Lee & Lee, 1998;Yoshinari et al, 2004). A incorporação de O 2 durante o processo de deposição do HMDSO melhora as propriedades tribológicas do filme (Lopes et al, 2012). Este tratamento promove alterações na molhabilidade da superfície, propiciando alterações na adsorção de proteínas e no comportamento das células Janocha et al, 2001), entretanto o efeito desse tratamento no processo corrosivo do Ti é limitado.…”
Section: Introductionunclassified