2012
DOI: 10.1016/j.tsf.2012.10.015
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Structural and optical properties of c-axis oriented aluminum nitride thin films prepared at low temperature by reactive radio-frequency magnetron sputtering

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Cited by 34 publications
(22 citation statements)
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“…The substrates were plasma etched for 10 minutes to increase the film's adherence. 36 The cathode target surface was first presputtered in an argon atmosphere for ~60 minutes at a working pressure of 0.4 Pa, in order to remove any possible remnant superficial impurities and equilibrate the surface composition.…”
Section: Magnetron Sputtering Depositionmentioning
confidence: 99%
“…The substrates were plasma etched for 10 minutes to increase the film's adherence. 36 The cathode target surface was first presputtered in an argon atmosphere for ~60 minutes at a working pressure of 0.4 Pa, in order to remove any possible remnant superficial impurities and equilibrate the surface composition.…”
Section: Magnetron Sputtering Depositionmentioning
confidence: 99%
“…When a coating is deposited by vacuum techniques such as PVD, the size of the crystallites can increases with increased coating thickness due to the evolutionary nature of the growth [22]. In larger crystallites, the lifetime of the electron/hole is also lengthened as the pair migrates a greater distance in large crystallites than in smaller crystallites [23].…”
Section: Page 4 Of 26mentioning
confidence: 99%
“…Prior to deposition, the substrate and the target were subjected individually to plasma cleaning treatments. The substrates were cleaned in situ for 15 min by argon ion etching following the protocol described in [60]. The target was pre-sputtered in the future deposition conditions for 30 min.…”
Section: Deposition Of Bio-ha Thin Films By Rf-msmentioning
confidence: 99%