2010
DOI: 10.1002/pssa.200925121
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Structural and optical properties of electron‐beam evaporated Al2O3‐doped V2O5 thin films for various applications

Abstract: The solid‐state reaction method was used to prepare tablets of (V2O5)100−x (Al2O3)x with x = 5, 10, 15, 20 wt. %. Thin films of Al2O3‐doped V2O5 were deposited onto glass substrates using an electron‐beam evaporation technique. The influence of doping and annealing temperature on the structural and optical characteristics has been investigated in detail. Optical properties of the films were studied extensively in the wavelength range 200–2500 nm from the measurements of the optical transmittance (T) and optica… Show more

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Cited by 15 publications
(4 citation statements)
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“…(K r J K , K r 1/E B ). This finding suggests that the lower values of K r provide higher values of both α and E B , while the vice is versa for the higher K r , in consistent with the reported elsewhere [ 57 , 58 ].
Fig.
…”
Section: Resultssupporting
confidence: 92%
See 1 more Smart Citation
“…(K r J K , K r 1/E B ). This finding suggests that the lower values of K r provide higher values of both α and E B , while the vice is versa for the higher K r , in consistent with the reported elsewhere [ 57 , 58 ].
Fig.
…”
Section: Resultssupporting
confidence: 92%
“…Furthermore, the higher valence state of the co-doping (Fe 3+ /Cu 2+/3 ) compared to Zn 2+ led to more deep acceptor levels which trap the electrons from the conduction band and then widening the energy gap. Moreover, it has been expected that (Fe + Cu) clusters may also form individual traces of oxides arising from the band structure and act as prime nonradiative recombination centers (native defects), and consequently a strong potential barrier could be formed [ 55 , 57 , 69 , 70 ]. Consequently, σ 1 and σ L of the Fe/ (Fe + Cu) samples are slightly lower than that of the ZnO, while E B and α are higher.…”
Section: Resultsmentioning
confidence: 99%
“…These results indicate that the increase in Ts to 1200 oC decreases non-ohmic characteristics and moves the breakdown fields to lower values. This is due to the decrease in the height of the potential barrier formed at the ZnO grain boundaries, which is usually caused by oxygen vacancies, in accordance with the data published [62,[63][64][65][66]. ZnO varistor's residual voltage ratio Kr is defined as the ratio of the electric field to a given current impulse and the breakdown field EB for a fixed diameter and ZnO thickness as follows; (7.4 mm < D < 21 mm), (0.5 mm <d < 4.5 mm).…”
Section: 2-i-v Characteristicssupporting
confidence: 89%
“…The increase of free carrier concentration up to Ts =1200 o C can be achieved by the decrease of oxygen deficiency or electrons in ZnO. For more clarification, free carrier concentration N is calculated using the average value of m * which has been reported for ZnO (m * =3.82 10 -25 g) [86], and therefore the interatomic distance (R) can be calculated by using the relation; R = (0.86/N (1/3) ) [66,67]. The values of N and R are listed in Table 2, and it is clear that N value is increased by increasing Ts, and the vice is versa for inter-atomic distance R.…”
Section: 4-dielectric Constant and Optical Conductivitymentioning
confidence: 99%