2018
DOI: 10.3390/coatings8100369
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Structural and Optical Properties of Luminescent Copper(I) Chloride Thin Films Deposited by Sequentially Pulsed Chemical Vapour Deposition

Abstract: Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 °C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spect… Show more

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Cited by 14 publications
(6 citation statements)
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“…The doublet at 200.1 and 201.7 eV (Cl 2p 3/2 and Cl 2p 1/2 ) represents organic chlorine, [ 36 ] corresponding to the CCl bond structure in CPTES, whereas another doublet at 198.6 and 200.2 eV (Cl 2p 3/2 and Cl 2p 1/2 ) is related to metal chloride, which may be due to the possible interaction between Cl and Cu. [ 37 ] XPS was also employed to measure the thickness of the coated silane layer. The experiment was conducted by comparing the XPS spectra of unmodified CuP with CuP@Cl samples, and the thickness was approximated by evaluating the intensity attenuation of the Cu 2p core‐level XPS signal.…”
Section: Resultsmentioning
confidence: 99%
“…The doublet at 200.1 and 201.7 eV (Cl 2p 3/2 and Cl 2p 1/2 ) represents organic chlorine, [ 36 ] corresponding to the CCl bond structure in CPTES, whereas another doublet at 198.6 and 200.2 eV (Cl 2p 3/2 and Cl 2p 1/2 ) is related to metal chloride, which may be due to the possible interaction between Cl and Cu. [ 37 ] XPS was also employed to measure the thickness of the coated silane layer. The experiment was conducted by comparing the XPS spectra of unmodified CuP with CuP@Cl samples, and the thickness was approximated by evaluating the intensity attenuation of the Cu 2p core‐level XPS signal.…”
Section: Resultsmentioning
confidence: 99%
“…[8] In addition to the compositional variation, disorderrelated effects contribute to the changes in the electronic and optical structure in these solid solutions. [9] With these electronic applications in mind, the synthesis of CuX films has become a hot topic in recent years, with a focus on chemical vapor deposition [10][11][12] and vacuum deposition techniques such as molecular beam epitaxy, [13,14] reactive sputtering, [15] and thermal evaporation. [8,16,17] At the same time, the cuprous halides are promising candidates for other applications, such as the use of CuBr in sensing, [18][19][20] or the use of CuCl as cathode in Mg primary batteries.…”
mentioning
confidence: 99%
“…Figure 6 shows the Cl2p peak of the CuK and CuT samples. The binding energy of Cl2p3/2 at 198.5eV was assigned to the Cu chloride (CuCl) [ 65 ]. There was no significant CuClOx on the surface that would give rise to Cl2p3/2 peaks at energies approximately 206–208 eV [ 66 ].…”
Section: Resultsmentioning
confidence: 99%