2018
DOI: 10.1134/s0030400x18060218
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Structural Anisotropy of Amorphous Silicon Films Modified by Femtosecond Laser Pulses

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Cited by 4 publications
(9 citation statements)
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“…In addition, it should be noted that the periods of both normal and anomalous surface lattices formed by femtosecond laser pulses at the a-Si:H surface in the present work are smaller than those obtained by our group in the previous experiments using a lower laser fluence [ 12 , 21 ]. According to modeling within Sipe theory such decrease of the LIPSS period is attributed to a lower nonequilibrium electrons density achieved during laser processing.…”
Section: Resultscontrasting
confidence: 78%
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“…In addition, it should be noted that the periods of both normal and anomalous surface lattices formed by femtosecond laser pulses at the a-Si:H surface in the present work are smaller than those obtained by our group in the previous experiments using a lower laser fluence [ 12 , 21 ]. According to modeling within Sipe theory such decrease of the LIPSS period is attributed to a lower nonequilibrium electrons density achieved during laser processing.…”
Section: Resultscontrasting
confidence: 78%
“…The formation of a periodic relief on metal, dielectric, and semiconductor surfaces irradiated by femtosecond laser pulses is often associated with the surface electromagnetic waves (SEW) generation [ 21 ]. For the normal LIPSS formation, the conditions for a certain SEW mode excitation—a surface plasmon-polariton—must be satisfied at the interface between two media [ 13 ]: where ε 1 = 1 is the dielectric permittivity corresponding to air, and ε 2 corresponds to the irradiated material.…”
Section: Theoretical Modeling Of the Lipss Formationmentioning
confidence: 99%
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“…Creation of the crystal layers of silicon from the amorphous by the heat treatement methods is an important process task [1][2][3]. In particular, the pulse laser annealing technologies for the amorphous silicon can be applied to create crystal layers of silicon [1] and complex heterostructures with crystal inclusions of silicon with the crystal inclusions of silicon with sizes of several nanometers [2]. After the ion implantation, the thermal annealing of the defects and the amorphization of the crystal layer is a standard procedure of the microelectronics technology [4].…”
Section: Introductionmentioning
confidence: 99%
“…The application of the light Raman scattering spectroscopy (RS) allows determining conditions of occurrence of the crystalline phase on the amorphous layer, the sizes of separate crystallites, the volume portion of the newly-formed phase [1,2] and the portions of the oriented crystallites [3]. The study of the angular dependences of the intensity of the RS polarized components in these layers shows a significant portion of the ordered crystallites [1,3].…”
Section: Introductionmentioning
confidence: 99%