2010
DOI: 10.4028/www.scientific.net/msf.666.41
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Structural Characterisation of Er Implanted, Ge-Rich SiO<sub>2</sub> Layers Using Slow Positron Implantation Spectroscopy

Abstract: Electroluminescence in SiO2 layers can be created by Ge implantation and a subsequent heat treatment, leading to the formation of Ge nano-particles inside the SiO2. An additional implantation of Er, connected with a further annealing, can lead to an improvement of the luminescent properties. However, the intensity of electroluminescence was found to decrease drastically after exceeding an optimum concentration of the Er doping. Slow positron implantation spectroscopy (SPIS), both in single (DB) and coincidence… Show more

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