2014
DOI: 10.1016/j.msec.2014.03.018
|View full text |Cite
|
Sign up to set email alerts
|

Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
6
0

Year Published

2015
2015
2023
2023

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 20 publications
(6 citation statements)
references
References 27 publications
0
6
0
Order By: Relevance
“…The simulations proved that the chosen dimensions of the locking lugs were right for case 1 and 3, and hence all other dependent components designed considering these dimensions would function without discrepancy. Further, fatigue life for AISI 4340 can be improved by TiCN coatings [15] and shotpeening [16], while titanium alloy can be worked out with NiCrAlY [17] and tantalum coatings [18] to achieve the same. 6.…”
Section: Resultsmentioning
confidence: 99%
“…The simulations proved that the chosen dimensions of the locking lugs were right for case 1 and 3, and hence all other dependent components designed considering these dimensions would function without discrepancy. Further, fatigue life for AISI 4340 can be improved by TiCN coatings [15] and shotpeening [16], while titanium alloy can be worked out with NiCrAlY [17] and tantalum coatings [18] to achieve the same. 6.…”
Section: Resultsmentioning
confidence: 99%
“…The three annealing temperatures for heat treatment were set at 300, 400 and 500°C [21,[29][30][31]. The heating rate was adjusted to 5°C min -1 until the target temperature was reached, at which the specimens were kept for 60 min [32,33]. In the final step, the samples were left in the furnace to cool naturally.…”
Section: Thermal Treatment Of Ta-o Coatingmentioning
confidence: 99%
“…So far, several techniques used for preparing Ta-based films have been reported, involving magnetron sputtering [13,14], ion beam assisted deposition (IBAD) [15], filtered cathodic vacuum arc deposition (FCVAD) [16], and chemical vapor deposition (CVD) [17]. Either way, the residual oxygen in the deposition chamber may lead to partial oxidation of the as-deposited Ta films to some extent.…”
Section: Introductionmentioning
confidence: 99%