Structural characteristics of Zn<sub>1-x</sub>Mn<sub>x</sub>Te polycrystalline films

Kurbatov, D. I.; Klymov, Oleksii; Opanasyuk, A. S.; Ponomarev, A.G.; Fochuk, P.; Khlyap, Halyna

doi:10.1117/12.928990

Cited by 3 publications

(2 citation statements)

References 12 publications

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“…Therefore, the device has a common optical axis with the microprobe and uses its object and aperture collimators (1, 2) together with one of the doublets of the magnetic quadrupole len ses (4). The first doublet (3) and the ferromagnetic scan- The granite girder (7) placed on anti-vibration supports is located behind the chamber with the studied microprobe samples (6). On this beam, the re is mounted the PBW device components: the ion beam line with pumps (11), the electrostatic scanner (8), the triplet of magnetic quadrupole len ses (9), and the new rectangular chamber with samp les (10), which is equipped with an optical mic roscope, a secondary electron detector, a charged particle detector, and a mechanism for po sitioning of the samples.…”

Section: Parameters Of Proton Beam Writing Devicementioning

confidence: 99%

“…Therefore, such a focusing system with a total length of about 4 m has a large working distance of 22 cm. Over the past decade, the microprobes have been used in various applications for microanalysis [6][7][8]. The motivation behind the development of a proton beam writing device is the need to reduce the probe size, which can be obtained at higher demagnificatoins.…”

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confidence: 99%

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Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

Ponomarev¹,

Rebrov²,

Kolinko³

2019

Sci. innov.

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Surface micro-and nanostructures have been being used in various physical applications such as Х-ray optics, photonics, microelectromechanical systems, metamaterials, etc. Problem Statement. The existing methods for fabricating such structures either are expensive or do not meet certain requirements (the aspect ratio and the quality of side wall surface). Purpose. To create a device for proton beam writing, which enables fabricating surface micro-and nanostructures with required parameters. Materials and Methods. One of alternative methods for fabricating the mentioned surface structures is proton beam writing. Silicon substrates coated with a positive resistive polymethyl methacrylate layer are used as samples for fabricating the surface structures. Results. A proton-beam lithography device based on an electrostatic accelerator has been developed, the configuration and specifications have been presented. The main parameters (demagnifications, proton beam current, and minimum probe dimensions) have been specified. Advantages of using quadrupole optics in fabricating micro-diffraction gratings have been shown. The first experiments on fabrication of source grating in X-ray phase-contrast tomographs with a characteristic line width of about 20 μm have been carried out. Conclusions. A new probe-forming system based on a separated magnetic quadrupole lense pentuplet has been used in the proposed device. The use of an electrostatic scanning system ensures a high accuracy of positioning the focused beam in a closed scanning cycle. The scanning process is controlled using a multifunctional reconfigurable input-output module with programmable logic. K e y w o r d s : proton beam writing, electrostatic accelerator, and magnetic quadrupole lens.

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Section: Parameters Of Proton Beam Writing Devicementioning

confidence: 99%

mentioning

confidence: 99%

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

Ponomarev¹,

Rebrov²,

Kolinko³

2019

Sci. innov.

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The new Sumy nuclear microprobe with single-stage quintuplet lens system

Ponomarev

Rebrov

Kolinko

et al. 2019

Nuclear Instruments and Methods in Physics Research Section B:

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Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

Ponomarev¹,

Rebrov²,

Kolinko³

2019

Nauka innov.

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Введение. Поверхностные микро-и наноструктуры находят свое применение в различных физических приложениях, таких как рентгеновская оптика, фотоника, микроэлектромеханические системы, метаматериалы и др. Проблематика. Существующие методы фабрикации таких структур являются либо дорогостоящими, либо не удовлетворяют определенным требованиям (величина аспектного отношения и качество поверхности их боковых стенок). Цель. Создание установки для протонно-лучевой литографии, позволяющей создавать поверхностные микро-и наноструктуры с требуемыми параметрами. Материалы и методы. Одним из альтернативных методов фабрикации вышеупомянутых поверхностных структур является протонно-лучевая литография. В качестве образцов для фабрикации поверхностных структур применяются подложки из кремния с нанесенным слоем позитивного резистивного материала полиметилметакрилата. Результаты. Разработана установка протонно-лучевой литографии на базе электростатического ускорителя, рассмотрены ее компоновка и особенности конструкции. Приведены основные параметры установки: коэффициенты уменьшения, ток протонного пучка, минимальные размеры зонда. Показаны преимущества применения ква друпольной оптики при фабрикации микродифракционных решеток. Проведены первые эксперименты по фаб рикации решетки-источника в рентгеновских фазоконтрастных томографах с характерной шириной линии око ло 20 мкм. Выводы. В предлагаемой установке применяется новая зондоформирующая система, основанная на распределенном пентуплете магнитных квадрупольных линз. Применение электростатической сканирующей системы обеспечивает высокую точность позиционирования сфокусированного пучка в замкнутом цикле сканирования. Управление процессом сканирования обеспечивается за счет применения многофункционального реконфигурируемого модуля ввода-вывода с программируемой логикой. К л ю ч е в ы е с л о в а: протонно-лучевая литография, электростатический ускоритель, магнитная квадрупольная линза.

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Structural characteristics of Zn_1-xMn_xTe polycrystalline films

Cited by 3 publications

References 12 publications

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

The new Sumy nuclear microprobe with single-stage quintuplet lens system

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

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Structural characteristics of Zn1-xMnxTe polycrystalline films

Cited by 3 publications

References 12 publications

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

The new Sumy nuclear microprobe with single-stage quintuplet lens system

Proton Beam Writing Device Based on Electrostatic Accelerator for 3D Micro- and Nano-Structure Fabrication

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Product

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Structural characteristics of Zn_1-xMn_xTe polycrystalline films