Structural characterization of laser ablated epitaxial (Ba_0.5Sr_0.5)TiO₃ thin films on MgO(001) by synchrotron x-ray scattering

Abstract

Epitaxial (Ba 0.5 Sr 0.5 ) TiO 3 thin films of two different thickness (∼25 and ∼134 nm) on MgO(001) prepared by a pulsed laser deposition method were studied by synchrotron x-ray scattering measurements. The film grew initially with a cube-on-cube relationship, maintaining it during further growth. As the film grew, the surface of the film became significantly rougher, but the interface between the film and the substrate did not. In the early stage of growth, the film was highly strained in a tetragonal structure (c/a ‫ס‬ 1.04) with the longer axis parallel to the surface normal direction. As the growth proceeded further, it relaxed to a cubic structure with the lattice parameter near the bulk value, and the mosaic distribution improved significantly in both in-and out-of-plane directions. The thinner film (∼25 nm) showed only one domain limited mainly by the film thickness, but the thicker film (∼134 nm) exhibited three domains along the surface normal direction.

Application of Ba0.5Sr0.5TiO3 (Bst) Film Doped with 0%, 2%, 4% and 6% Concentrations of RuO2 as an Arduino Nano-Based Bad Breath Sensor

“…BST film can be produced using fairly simple equipment on a tight budget and in relatively short time [9][10][11]. In the film-producing process, there are a number of methods that could be used such as the metalorganic chemical vapor deposition (MOCVD) method [12][13][14], the chemical vapor deposition method [15], the sol-gel method [16][17][18][19], the atomic layer deposition (ALD) method [20], the pulsed laser ablation deposition (PLAD) method [21,22], rf sputtering [17,23,24], and chemical solution deposition (CSD) method [24][25][26][27][28][29][30][31]. The CSD method is superior as it can control the film stoichiometry with good quality, an easy procedure, and has a fairly affordable cost [32][33][34].…”

Modified Spin Coating Method for Coating and Fabricating Ferroelectric Thin Films as Sensors and Solar Cells

“…CSD method is one of the methods to create/develop thin films [2][3][4][5][6][7][8][9][10][11][12], which has advantages including the ability to control the film stoichiometry with good quality, easy procedure, require relatively low cost, and generate a good crystalline phase [13][14][15]. In addition, thin films can also be fabricated by other methods such as metal organic chemical vapor deposition (MOCVD) [16][17][18], chemical vapor deposition [19], sol-gel [20][21][22][23], atomic layer deposition (ALD) [24], metal organic decomposition (MOD) [25], pulsed laser ablation deposition (PLAD) [26,27], and RF sputtering [2,21,28].…”

Surface Roughness and Grain Size Characterization of Annealing Temperature Effect For Growth Gallium and Tantalum Doped Ba_0.5 Sr_0.5TiO₃Thin Film

“…BT and BST films can be formed by various methods, such as chemical solution deposition (CSD) [1,2,4], metal organic chemical vapor deposition (MOCVD) [5][6][7], rf sputtering [8][9][10][11][12][13] and Pulsed Laser Ablation Deposition (PLAD) [14]. CSD Method is of particular interest because of its good control of stoichiometry, ease of fabrication and low temperature synthesis.…”