2023
DOI: 10.54966/jreen.v26i1.1116
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Structural Characterization of ZnO Thin Films Deposited onto Silicon Substrates using Cathodic Magnetron Sputtering

Leila Ghalmi,
Souhila Bensmaine,
Chems El Hayat Merzouk

Abstract: In this study, we analyzed Zinc Oxide (ZnO) thin films deposited on silicon substrates using magnetron sputtering. These films have numerous applications in photovoltaic and optoelectronic devices due to their excellent physique properties. We used two structural characterization techniques: X-ray diffraction and scanning electron microscopy. We found that the ZnO films had good crystallinity and a columnar structure on the substrate surface, as indicated by the (002) orientation. These findings could potentia… Show more

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“…ZnO thin films can be obtained through various methods, such as metal-organic chemical vapor deposition (CVD) [31,32], magnetron sputtering [33,34], molecularbeam epitaxy [35,36], sol-gel [37], spray pyrolysis [38,39] and electrodeposition [40][41][42]. What is interesting about the latter is the simple scalability, film control, and the possibility of depositing structures in many different shapes and sizes without using high temperatures or expensive equipment.…”
Section: Introductionmentioning
confidence: 99%
“…ZnO thin films can be obtained through various methods, such as metal-organic chemical vapor deposition (CVD) [31,32], magnetron sputtering [33,34], molecularbeam epitaxy [35,36], sol-gel [37], spray pyrolysis [38,39] and electrodeposition [40][41][42]. What is interesting about the latter is the simple scalability, film control, and the possibility of depositing structures in many different shapes and sizes without using high temperatures or expensive equipment.…”
Section: Introductionmentioning
confidence: 99%
“…There is a wide variety of synthesis of ZnO thin films [19] such as molecular-beam epitaxy, [20,21] metal-organic chemical vapor deposition, [22,23] sol-gel, [24,25] spray pyrolysis, [26,27] magnetron sputtering [28,29] and electrodeposition. [30][31][32] This last method is very attractive due to its advantages, such as the variety of sizes and shapes that can be used as a substrate, the low temperatures that are generally used, the film control that it allows, the low cost that it requires, and the industrial scalability.…”
Section: Introductionmentioning
confidence: 99%