Structural control of silane-grafted polymethylsilsesquioxane

Preparation and Characterization of Narrow Size Distribution PMSQ Microspheres for High-Frequency Electronic Packaging

“…Figure 7 a shows the FT-IR spectrum of as-prepared PMSQ microspheres. According to previous literature, the absorption band at 2979 cm −1 corresponds to asymmetrical stretching vibration of methyl group (-CH 3 ) [ 28 , 35 ]. The absorption band at 1272 cm −1 is characteristic of the stretching vibration of Si–CH 3 , and the bands of absorption at 779 and 850 cm −1 correspond to the out-of-plane agitation of methyl group in Si–CH 3 .…”

“…Kai Xi et al, prepared a class of PMSQ films with ultra-low dielectric constant of 1.6 at 1 MHz by using T 8 (Me 4 NO) 8 polyhedral oligomeric silsesquioxanes (T 8 POSS) as double-effective porogen [ 27 ]. Wen Pin Chuang et al, prepared a series of silane-grafted PMSQ with a controllable structure and molecular weight by grafting tetraethoxysilane (TEOS) and 1H,1H,2H,2H-perfluorodecyltriethoxysilane (PFDTS) on the PMSQ, finding that the molecular structure changed from regular to an irregular random network structure and the RI at 583 nm decreased from 1.50 to 1.42 [ 28 ]. Bong Jun Cha et al, realized nanoporous low-k thin (2.12) films with mechanically robust properties using adamantylphenol porogens chemically linked to the PMSQ matrix [ 29 ].…”