2010
DOI: 10.1109/jlt.2010.2061836
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Structural Effects on Highly Directional Far-Field Emission Patterns of GaN-Based Micro-Cavity Light-Emitting Diodes With Photonic Crystals

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Cited by 20 publications
(16 citation statements)
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“…Since the same phosphor rubber and configuration is used for all three scenarios and there is no diffusing element presented in the setup, the difference of the far field emission pattern is solely attributed to the effect of the beam angle of the light emitters, which refer to the LED, SLD or LD. For instance, LED, as a surface emitter, exhibits a Lambertian emission pattern, where the intensity profile is proportional to the cosine of the emission angle [33]. Both SLD and LD are edge emitter, and narrower beam angles are expected compared to that of the LED.…”
Section: Sld Based Phosphor Converted White Lightmentioning
confidence: 99%
“…Since the same phosphor rubber and configuration is used for all three scenarios and there is no diffusing element presented in the setup, the difference of the far field emission pattern is solely attributed to the effect of the beam angle of the light emitters, which refer to the LED, SLD or LD. For instance, LED, as a surface emitter, exhibits a Lambertian emission pattern, where the intensity profile is proportional to the cosine of the emission angle [33]. Both SLD and LD are edge emitter, and narrower beam angles are expected compared to that of the LED.…”
Section: Sld Based Phosphor Converted White Lightmentioning
confidence: 99%
“…LEE is thus enhanced by destructing TIR and converting the waveguide modes into air modes. Although diffractive gratings work well to solve the problem of poor LEE [30], it is still very challenging to determine the various optimization parameters due to its heavy computational burden [31]- [33]. These parameters, such as the thickness of GaN, the position of source (quantum wells), filling factor, lattice constant and hole depth, all play important roles in the LEE of GaN-based LED.…”
Section: Introductionmentioning
confidence: 99%
“…Dry etching of GaN, on the contrary, is not impacted by those characteristics and, in addition, shows a fairly good anisotropy when covered by a hard etch mask such as SiO 2 , SiN x or Ni. Thus, several techniques such as inductively coupled plasma (ICP) etching have been employed, together with etch masks, to create nanoporous GaN films 29 , but mainly to achieve 2D PhC on the surface of a LED structure [20][21][22][23] . In that case, the configuration of the nanoholes can be accurately tuned and controlled by various nanopatterning techniques, such as electron beam lithography, interference lithography or nanoimprint lithography.…”
mentioning
confidence: 99%