Structural, electrical and piezoelectric properties of LiNbO3 thin films for surface acoustic wave resonators applications

Edon, V.; Rémiens, Denis; Saada, S.

doi:10.1016/j.apsusc.2009.09.002

Cited by 29 publications

(17 citation statements)

References 36 publications

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“…To sum up, there is a main tendency for all studied samples regardless of sputtering environment and reactive gas pressure: TA leads to formation of Li-poor LiNb 3 [14]. The effect of oxygen atmosphere on crystallization, morphology and properties of LiNbO 3 thin films has been studied in [15].…”

Section: Resultsmentioning

confidence: 98%

“…At the same time, TA brings about a surface transformation processes like raise in the surface roughness, weakening the film texture [13] as well as formation of the surface layers influencing the ferroelectric properties of treated heterostructures. Also, TA improves a O/Nb ratio in the as-grown LiNbO 3 films [14]. Some authors performed annealing in oxygen atmosphere [15] to prevent volatility of Li 2 O, control the stoichiometry and improve the electrical properties of the films.…”

Section: Introductionmentioning

confidence: 99%

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Influence of thermal annealing on structural properties and oxide charge of LiNbO3 films

Sumets

Kostyuchenko

Иевлев

et al. 2015

J Mater Sci: Mater Electron

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C-oriented polycrystalline lithium niobate (LiNbO 3 ) films have been deposited on Si substrate by the radio-frequency magnetron sputtering method in an Ar atmosphere and Ar ? O 2 gas mixture. All as-grown LiNbO 3 films manifested positive fixed oxide charge regardless of the sputtering conditions. Donor centers are formed in Si substrate because of diffusion of O 2 molecules during sputtering process. Thermal annealing (TA) of the deposited films leads to increase in the surface roughness and grain size as well as formation of LiNb 3 O 8 phase in the studied films. Also, TA resulting in the decline of positive oxide charge due to the diffusion of oxygen molecules into LiNbO 3 films from air and out-diffusion from Si substrate.

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Section: Resultsmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

Influence of thermal annealing on structural properties and oxide charge of LiNbO3 films

Sumets

Kostyuchenko

Иевлев

et al. 2015

J Mater Sci: Mater Electron

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“…Among several methods for fabrication of thin films, e.g., sputtering [7], liquid phase epitaxy [8], sol-gel method [9], etc, the PLD method has advantages over others in the following points, (1) materials stoichiometry can be maintained, (2) oxygen-deficiencies can be controlled by adjustment of atmospheric gas pressure and (3) film's thickness is simply proportional to the number of the pulses radiated onto the targets [10].…”

Section: A Fabrication Of the Thin Films By The Pld Methodsmentioning

confidence: 99%

Structural investigation of LN/LT<sup>1</sup> superlattice thin films by field effect scanning transmission electron microscopy equipped with electron disspersive x-ray spectroscopy

Kobata

Tsukahara

Uesu

et al. 2011

2011 International Symposium on Applications of Ferroelectrics (ISAF/PFM) and 2011 International Symposium on Piezoresponse For

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“…Method radiofrequency magnetron sputtering (RFMS) and ion beam sputtering (IBS) are also among the effective methods for forming of complex oxides while preserving the initial elemental composition. It has been demonstrated that RFMS method can be used effectively for growing thin LiNbO 3 films on different substrates [4][5][6]. Many authors emphasized that sputtering conditions such as substrate temperature, reactive gas composition and pressure affected films properties during the growth process [7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Sputtering condition effect on structure and properties of LiNbO3 films

Sumets

Kostyuchenko

Иевлев

et al. 2015

J Mater Sci: Mater Electron

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Polycrystalline LiNbO 3 films were grown on various substrates by the radio-frequency magnetron sputtering (RFMS) method and ion-beam sputtering (IBS) method at different sputtering conditions. Films formed on the substrates situated within erosion zone (plasma effect) manifested textured structure. When plasma effect became insignificant only LiNbO 3 films with random size orientation were formed during the RFMS process and IBS process with an increase in the size of the crystallites. Reactive gas pressure as part of plasma effect has a profound effect on the films' properties. When gas pressure was increased greatly, grain size declined two fold and the average surface roughness of the grown films doubled. At the higher gas pressure Li-poor phase LiNb 3 O 8 appeared along with LiNbO 3 during the growth process. As a result, the film texture disappeared. Single phase LiNbO 3 films with two-axes (epitaxial) texture are formed on (111)Ag epitaxial film during the RFMS process at the ion assisted conditions.

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Structural, electrical and piezoelectric properties of LiNbO3 thin films for surface acoustic wave resonators applications

Cited by 29 publications

References 36 publications

Influence of thermal annealing on structural properties and oxide charge of LiNbO3 films

Influence of thermal annealing on structural properties and oxide charge of LiNbO3 films

Structural investigation of LN/LT<sup>1</sup> superlattice thin films by field effect scanning transmission electron microscopy equipped with electron disspersive x-ray spectroscopy

Sputtering condition effect on structure and properties of LiNbO3 films

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