A GaMnAs nanoelectromechanical resonator is used to obtain the first measurement of magnetostriction in a dilute magnetic semiconductor. Resonance frequency shifts induced by field-dependent magnetoelastic stress are used to simultaneously map the magnetostriction and magnetic anisotropy constants over a wide range of temperatures. Owing to the central role of carriers in controlling ferromagnetic interactions in this material, the results appear to provide insight into a unique form of magnetoelastic behavior mediated by holes. DOI: 10.1103/PhysRevLett.95.187206 PACS numbers: 75.80.+q, 75.50.Pp, 75.70.ÿi, 85.85.+j The dilute magnetic semiconductor (DMS) GaMnAs has been extensively studied for its promising spintronics applications [1,2]. Among its properties is the dominant role of growth-induced strain upon the material's magnetic alignment. A change from compressive to tensile strain is known to flip the moments from in plane to out of plane [1]. This is consistent with the inverse magnetoelastic effect, but the magnetoelastic coupling parameters that quantify this behavior have remained elusive. These parameters are important in gauging the impact of magnetostriction on magnetic [3] and electrical transport properties [4,5], and are therefore essential to a comprehensive understanding of DMS systems. Here, we demonstrate a scheme to observe magnetostriction directly in a resonant nanoelectromechanical system (NEMS). Similarities between the piezoresistive, piezoelectric, and elastic properties of GaMnAs to conventionally doped GaAs enable straightforward electromechanical actuation and transduction [6,7] of a doubly clamped beam resonator. Mechanical resonance frequency variations occur as the device is stretched or compressed magnetoelastically in an applied magnetic field, providing a measure of magnetostriction with an accuracy comparable to other methods [8,9]. Furthermore, the angular dependence of the observed magnetostriction enables measurement of another important property, magnetic anisotropy.The material is grown epitaxially on an (001) GaAs substrate, beginning with a 1 m Al 0:8 Ga 0:2 As sacrificial layer, followed by 50 nm high temperature and 50 nm low temperature GaAs, and finally 80 nm unannealed Ga 0:948 Mn 0:052 As with a Curie temperature of 57 K. The spontaneous magnetization is expected to lie in the growth plane due to a compressive strain from the substrate and demagnetization effects. Electron beam lithography is used to define the device profile, which is subsequently covered with a titanium etch mask. Next, argon ion milling removes all magnetic material not protected by the mask. A 30 nm-thick gold side gate is deposited 0:7 m away from the beam after another lithography step. Finally, a rectangular resist window is patterned to expose the sacrificial layer, which is selectively removed along with the remaining titanium mask in dilute hydrofluoric acid. The resulting suspended structure, shown in the inset of Fig. 1(a), has dimensions of L; w; t 6; 0:5; 0:18 m, with its longit...