2022
DOI: 10.3390/met12091525
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Structural Evolution of Bulk Silver during Cold Rolling and Annealing

Abstract: Sputtering target is commonly used in semiconductor manufacturing for the preparation of thin films. Cold rolling and annealing treatment of bulk Ag is the routine process to prepare Ag sputtering target. In this paper, the microstructure evolution of Ag after cold rolling and annealing treatment was studied, and the results showed that annealing temperature affects the recrystallized structure of Ag and that 600 °C/1 h treatment can achieve complete recrystallization. At the same time, the texture evolution w… Show more

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Cited by 3 publications
(2 citation statements)
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“…Thus, the deposited foil adherence was increased by the coin hammering, which presses the fine grains resulting after Hg evaporation into a compact structure embedded into the copper grains of the substrate, a fact proved by the microstructural aspects observed in Figure 5a. Cold pressing of the thin silver foil is sustained by the lack of Ag-twined grains, which are indicators of tin foil recrystallization [33,34]. A clear mark of the "Kipper" element of the crisis is the hole pierced into the forged coin from 1620 that clearly reveals its copper core.…”
Section: Discussionmentioning
confidence: 99%
“…Thus, the deposited foil adherence was increased by the coin hammering, which presses the fine grains resulting after Hg evaporation into a compact structure embedded into the copper grains of the substrate, a fact proved by the microstructural aspects observed in Figure 5a. Cold pressing of the thin silver foil is sustained by the lack of Ag-twined grains, which are indicators of tin foil recrystallization [33,34]. A clear mark of the "Kipper" element of the crisis is the hole pierced into the forged coin from 1620 that clearly reveals its copper core.…”
Section: Discussionmentioning
confidence: 99%
“…This occurrence of the Ag (210) plane is due to the grain reorientation of Ag, as mentioned in previous reports. 44 the intensity of the peak denoting the (111) plane decreases. With a further increase in plasma exposure duration (450sP Si/Ag), the peak corresponding to the (210) plane diminishes, and only the (111) plane remains in the 600sP Si/Ag sample.…”
Section: B Crystallinity and Morphology 1 X-ray Diffraction (Xrd) Ana...mentioning
confidence: 96%