2018
DOI: 10.1007/s10853-018-3004-y
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Structural investigations of pulsed laser-deposited NiO epitaxial layers under different fluence values

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Cited by 4 publications
(6 citation statements)
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“…Increase in FL causes increase in out-of plane lattice parameters in NiO thin films grown on Al2O3 (0001) [39]. In our investigation, under a constant FL the strain accommodation in the film decreased as tF increased, and a NiO film that had tF = 200 nm was totally relaxed.…”
Section: Nickel Monoxidementioning
confidence: 51%
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“…Increase in FL causes increase in out-of plane lattice parameters in NiO thin films grown on Al2O3 (0001) [39]. In our investigation, under a constant FL the strain accommodation in the film decreased as tF increased, and a NiO film that had tF = 200 nm was totally relaxed.…”
Section: Nickel Monoxidementioning
confidence: 51%
“…The sharp peak reveals an atomically long range-ordered area. This feature has been never seen in previous works on NiO films [32][33][34][35][36][37][38][39][40][41]. The emergence of the broad component shows the formation of sub-grains (mosaic structure); this process breaks the long-range atomic arrangement.…”
Section: Nickel Monoxidementioning
confidence: 57%
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“…Therefore, the better crystal interface, the more apparent Pendellösung interference fringes. [24,25] The diffraction peak of sample 2 in ω-2θ scanning is more obvious, which also indicates its better crystal quality.…”
Section: Xrd Testmentioning
confidence: 96%